Range Analysis of Thermal Stress and Optimal Design for Tungsten-Rhenium Thin Film Thermocouples Based on Ceramic Substrates

Zhang, Zhongkai; Tian, Bian; Yu, Qiuyue; Shi, Peng; Lin, Qijing; Zhao, Na; Jing, Weixuan

doi:10.3390/s17040857

Cited by 23 publications

(7 citation statements)

References 8 publications

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“…The stress finite element model was set to design the size parameters of the TFTCs [21]. In the thermal stress finite element analysis (FEA) by ANSYS (ANSYS Inc., Berkeley, CA, US), the isotropic, thermoplastic and orthotropic behavior of the material was considered.…”

Section: Resultsmentioning

confidence: 99%

Thermoelectric Characteristics of Silicon Carbide and Tungsten-Rhenium-Based Thin-Film Thermocouples Sensor with Protective Coating Layer by RF Magnetron Sputtering

et al. 2019

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A thin-film thermocouples (TFTCs) sensor based on silicon carbide substrate, 95 wt% tungsten–5 wt% rhenium (W-5Re) and 74 wt% tungsten–26 wt% rhenium (W-26Re) thermosensitive part with aluminum oxide protective coating layer was designed and fabricated by radio frequency (RF) magnetron sputtering. It exhibited a high thermoelectric voltage of 35.51 mV when the temperature difference was 1240 °C (the hot junction temperature was 1420 °C), with an average Seebeck coefficient of 28.63 µV/°C, which was 27% larger than the standard C-type thermocouple wires at the same temperature difference. The repeatability error was ±4.1%, the drift rate was 9.6 °C/h for 10 h and the laser response time was 0.36 ms. Compared to the traditional thermocouple, it could provide long-term temperature testing within 1420 °C for the requirement of high-temperature measurement and high response speed.

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Section: Resultsmentioning

confidence: 99%

Thermoelectric Characteristics of Silicon Carbide and Tungsten-Rhenium-Based Thin-Film Thermocouples Sensor with Protective Coating Layer by RF Magnetron Sputtering

et al. 2019

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“…Consequently, temperature sensors are indispensable for obtaining accurate operational temperatures. Not only do these sensors serve as a basis for enhancing engine efficiency, but they also facilitate the real-time monitoring of engine operational status [5][6][7][8][9].…”

Section: Introductionmentioning

confidence: 99%

High-Temperature Failure Evolution Analysis of K-Type Film Thermocouples

Ruan,

Li,

Xiao

et al. 2023

Micromachines

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Ni90%Cr10% and Ni97%Si3% thin-film thermocouples (TFTCs) were fabricated on a silicon substrate using magnetron sputtering technology. Static calibration yielded a Seebeck coefficient of 23.00 μV/°C. During staged temperature elevation of the TFTCs while continuously monitoring their thermoelectric output, a rapid decline in thermoelectric potential was observed upon the hot junction reaching 600 °C; the device had failed. Through three cycles of repetitive static calibration tests ranging from room temperature to 500 °C, it was observed that the thermoelectric performance of the TFTCs deteriorated as the testing progressed. Utilizing the same methodology, Ni-Cr and Ni-Si thin films corresponding to the positive and negative electrodes of the TFTCs were prepared. Their resistivity after undergoing various temperature annealing treatments was measured. Additionally, their surfaces were characterized using Scanning Electron Microscopy (SEM) and X-ray Photoelectron Spectroscopy (XPS). The causes behind the decline in thermoelectric performance at elevated temperatures were analyzed from both chemical composition and microstructural perspectives.

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“…Tungsten-rhenium TFTCs exhibit superior performance due to their high melting point of approximately 2800 °C and ease of oxidation [ 17 ]. Although we previously demonstrated that high temperature failure can be avoided using an alumina protective layer on tungsten-rhenium TFTCs, the drift rate (DT) is high (9.6 °C/h), resulting in low thermoelectric stability [ 18 ].…”

Section: Introductionmentioning

confidence: 99%

Influences of RF Magnetron Sputtering Power and Gas Flow Rate on a High Conductivity and Low Drift Rate of Tungsten-Rhenium Thin-Film Thermocouples

et al. 2022

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Thin-Film Thermocouples (TFTCs) are characterized by their high spatial resolutions, low cost, high efficiency and low interference on the air flow. However, the thermal stability of TFTCs should be further improved for application since their accuracy is influenced by joule heat and temperature time drift. In this paper, 3D molecular dynamics and finite element analysis are used for structural design. The effects of RF magnetron sputtering power and gas flow rate on conductivity and temperature time drift rate (DT) of high thermal stability tungsten–rhenium (95% W/5% Re vs. 74% W/26% Re) TFTCs were analyzed. According to the experimental results, the average Seebeck coefficient reached 31.1 µV/°C at 900 °C temperature difference (hot junction 1040 °C) with a repeatability error at ±1.37% in 33 h. The conductivity is 17.1 S/m, which is approximately 15.2 times larger than the compared tungsten-rhenium sample we presented, and the DT is 0.92 °C/h (1040 °C for 5 h), which is 9.5% of the old type we presented and 4.5% of compared ITO sample. The lumped capacity method test shows that the response time is 11.5 ms at 300 °C. This indicated an important significance in real-time temperature measurement for narrow spaces, such as the aero-engine combustion chamber.

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Range Analysis of Thermal Stress and Optimal Design for Tungsten-Rhenium Thin Film Thermocouples Based on Ceramic Substrates

Cited by 23 publications

References 8 publications

Thermoelectric Characteristics of Silicon Carbide and Tungsten-Rhenium-Based Thin-Film Thermocouples Sensor with Protective Coating Layer by RF Magnetron Sputtering

Thermoelectric Characteristics of Silicon Carbide and Tungsten-Rhenium-Based Thin-Film Thermocouples Sensor with Protective Coating Layer by RF Magnetron Sputtering

High-Temperature Failure Evolution Analysis of K-Type Film Thermocouples

Influences of RF Magnetron Sputtering Power and Gas Flow Rate on a High Conductivity and Low Drift Rate of Tungsten-Rhenium Thin-Film Thermocouples

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