2018
DOI: 10.1117/1.oe.57.8.087106
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Random antireflective nanostructuring on binary near-wavelength period gratings

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Cited by 6 publications
(2 citation statements)
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“…These phase boundary effects are due to reactive plasma action, partially etching the side walls during the fabrication of the nanostructures. 22 Any alterations of the DOE transverse feature size and longitudinal phase depth should result in measurable variations of the designed projection patterns and full-field scatter signatures in transmission and reflection. Measurements of these perturbations can give insight into possible undesirable effects of the rARSS on the original DOE profile.…”
Section: Randomly Textured Antireflection Surface Fabricationmentioning
confidence: 99%
“…These phase boundary effects are due to reactive plasma action, partially etching the side walls during the fabrication of the nanostructures. 22 Any alterations of the DOE transverse feature size and longitudinal phase depth should result in measurable variations of the designed projection patterns and full-field scatter signatures in transmission and reflection. Measurements of these perturbations can give insight into possible undesirable effects of the rARSS on the original DOE profile.…”
Section: Randomly Textured Antireflection Surface Fabricationmentioning
confidence: 99%
“…Layered thin-film coatings are commonly used for antireflectivity, but they come with specific challenges when applied to complicated optical surface profiles. As an alternative, random antireflective structured surfaces (rARSS) offer advantages, including broadband antireflectivity, performance insensitivity to polarization and angle of incidence, suppression of directional reflectance and controlled wide-angle scatter, and can be monolithically added to complicated profiles of various components [1][2][3][4][5] . These nanostructured surfaces can be nearly isotropic, dense, and without periodicity or repetitive spatial signatures.…”
Section: Introductionmentioning
confidence: 99%