2016
DOI: 10.1063/1.4939985
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Raman characterization of damaged layers of 4H-SiC induced by scratching

Abstract: Recent development of device fabrication of SiC is awaiting detailed study of the machining of the surfaces. We scratched 4H-SiC surfaces with a sliding microindenter made of a SiC chip, and characterized machining affected layers by micro-Raman spectroscopy. The results of the Raman measurement of the scratching grooves revealed that there were residual stress, defects, and stacking faults. Furthermore, with heavy scratching load, we found clusters of amorphous SiC, Si, amorphous carbon, and graphite in the s… Show more

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Cited by 36 publications
(20 citation statements)
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“…At 950°C, as the reflectance was decreased, the Raman peak intensity was recovered as seen in Fig 4(E) and 4(F) , which can be also induced by the slightly decreased nanostructure coverage. With respect to the peak position, the A 1g peaks appeared at ~ 417.6 cm -1 with the minor shift within 0.1 cm -1 , suggesting the sapphire lattice strain induced by the Pt NSs fabrication stayed in a low level [ 42 , 43 ]. In addition, the FWHMs were distributed stably between 8 and 8.5 cm -1 .…”
Section: Resultsmentioning
confidence: 99%
“…At 950°C, as the reflectance was decreased, the Raman peak intensity was recovered as seen in Fig 4(E) and 4(F) , which can be also induced by the slightly decreased nanostructure coverage. With respect to the peak position, the A 1g peaks appeared at ~ 417.6 cm -1 with the minor shift within 0.1 cm -1 , suggesting the sapphire lattice strain induced by the Pt NSs fabrication stayed in a low level [ 42 , 43 ]. In addition, the FWHMs were distributed stably between 8 and 8.5 cm -1 .…”
Section: Resultsmentioning
confidence: 99%
“…As shown in Figure 13 , the different Raman bands of the different crystal structures (i.e., 6H-SiC, 4H-SiC and stacking faults) were characterized successfully. The scratching of 4H-SiC was also analyzed using Raman spectroscopy by Nakashima et al [ 81 ]. After scratching, the broadening and/or asymmetry of the FTO (1/2) (776 cm −1 ) and LO (964 cm −1 ) modes and the downshift of the FTO (1/2) mode were observed.…”
Section: Raman Spectroscopy Characterization In Micro/nano-machinimentioning
confidence: 99%
“…To reveal the reason for the strain rate effect on the critical depth of DBT of HP-SiC ceramics, the removal mechanism of material should be investigated in-depth. Raman spectroscopy is a powerful technique that is used to characterise the structure of SiC [ 24 , 25 ]. Figure 10 a shows the Raman spectrum that was collected from the different positions that marked in Figure 10 b,c.…”
Section: Resultsmentioning
confidence: 99%