Radiation stability of SiC and diamond membranes as potential x-ray lithography mask carriers

Abstract

In this paper we report on the radiation stability of silicon carbide and diamond membranes as potential x-ray lithography mask carriers. Silicon carbide membranes have been produced by epitaxial chemical vapor deposition (CVD). Diamond membranes have been produced in tension with diameters up to 2.5 cm using a microwave plasma CVD process. The stability of these membranes upon exposure to x rays has been studied. The materials were characterized before and after irradiation for their stress, Young’s modulus, infrared absorption from 2.5 to 25 μm, and visible transmission from 300 to 800 nm. The x-ray exposures were performed using the Center for X-ray Lithography beamlines at the Aladdin synchrotron at the University of Wisconsin. These beamlines provide a broadband x-ray spectrum from 900 to 5000 eV. Incident doses of 6700 and 2400 J/cm2 were delivered to the silicon carbide and diamond samples, respectively. Both materials were found to be stable for these exposure levels within the accuracy of the experimental methods.

A molecular dynamics study of nanoindentation of amorphous silicon carbide

“…[1][2][3][4] SiC in the amorphous alloy form, a-SiC, has many outstanding physical properties, such as very low coefficient of sliding friction, 5 high hardness, and high wear resistance, which allow for the application of a-SiC as hard surface coatings. 6 Because of its high Young's modulus, [7][8][9] a-SiC is also an excellent material for x-ray lithography mask membrane. Additionally, the stability of its semiconducting properties over a wide range of temperatures makes a-SiC a suitable material for device and structural applications.…”

High-aspect-ratio microstructures for magnetoelectronic applications

“…Fig.2(b) shows 10-µm wide loops and lines on the first mask for the aligned exposure. For aligned x-ray exposures, a number of materials, such as boron-doped silicon 23,24 , silicon nitride 11,23 , silicon carbide [23][24][25][26] , diamond [23][24][25]27 , and polyimide [15][16][17][18][19][20][21] , have been utilized as membranes. While stiff materials offer better mechanical support and thus less mask distortion, their membranes must be thin enough (typically less than 1 µm) to transmit sufficient visible light.…”

Computer simulation of obtaining thin films of silicon carbide

“…8 Films of hydrogenated amorphous silicon carbide (a-SiC:H) can be used in optoelectronic devices, 9 solar cells, 10 and also as high-temperature coatings 11 and X-ray masks. 12 Among other things, SiC can be used to obtain graphene. In work 13 discusses the method of thermal graphitization of silicon for the controlled production of graphene layers.…”