2014
DOI: 10.1016/j.microrel.2014.07.079
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Radiation sensitivity of junctionless double-gate 6T SRAM cells investigated by 3-D numerical simulation

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Cited by 18 publications
(15 citation statements)
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“…This indicates that the bipolar amplification (Fig. 7b) is very low and that there is a strong recombination of the deposited charge in the device [10]. The bipolar gain is always higher in junctionless than in inversion-mode devices, but has similar dependences on ion hit location for the four structures.…”
Section: Device Sensitivity To Ion Hit Locationmentioning
confidence: 86%
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“…This indicates that the bipolar amplification (Fig. 7b) is very low and that there is a strong recombination of the deposited charge in the device [10]. The bipolar gain is always higher in junctionless than in inversion-mode devices, but has similar dependences on ion hit location for the four structures.…”
Section: Device Sensitivity To Ion Hit Locationmentioning
confidence: 86%
“…The deposited charge, Q DEP, is also reported for comparison. Q DEP is highest in the middle of the channel and decreases toward the source and drain sides of the silicon film, because a reduced part of the ion track is contained in the active region [10]. Q COLL has a bell-shaped profile with a maximum at x=40 nm.…”
Section: Device Sensitivity To Ion Hit Locationmentioning
confidence: 99%
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“…This indicates that the bipolar amplification (Fig. 8b) is very low and that there is a strong recombination of the deposited charge in the device [28]. The bipolar gain (Fig.…”
Section: Ion Hit Location Sensitivitymentioning
confidence: 89%
“…The deposited charge is also reported for comparison. Q DEP is highest in the middle of the channel and decreases toward the source and drain sides of the silicon film, mainly because a reduced part of the ion track is contained in the active region [28]. Q COLL has a bell-shaped profile with a maximum around the middle of the channel (where Q DEP is the highest) and two minima at the source and drain contacts (where Q DEP is the lowest).…”
Section: Ion Hit Location Sensitivitymentioning
confidence: 99%