1974
DOI: 10.1109/tns.1974.6498929
|View full text |Cite
|
Sign up to set email alerts
|

Radiation induced leakage current in N-channel SOS transistors

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

1976
1976
2005
2005

Publication Types

Select...
3
1
1

Relationship

0
5

Authors

Journals

citations
Cited by 31 publications
(1 citation statement)
references
References 0 publications
0
1
0
Order By: Relevance
“…Kjar and Peel,199 Neamen et al, 200 and Schlesier 201 showed that positive charge can be trapped near the silicon-sapphire interface in a manner similar to that which causes positive charges to be trapped near the silicon-dioxide interface. Kjar and Peel,199 Neamen et al, 200 and Schlesier 201 showed that positive charge can be trapped near the silicon-sapphire interface in a manner similar to that which causes positive charges to be trapped near the silicon-dioxide interface.…”
Section: Radiation Studiesmentioning
confidence: 99%
“…Kjar and Peel,199 Neamen et al, 200 and Schlesier 201 showed that positive charge can be trapped near the silicon-sapphire interface in a manner similar to that which causes positive charges to be trapped near the silicon-dioxide interface. Kjar and Peel,199 Neamen et al, 200 and Schlesier 201 showed that positive charge can be trapped near the silicon-sapphire interface in a manner similar to that which causes positive charges to be trapped near the silicon-dioxide interface.…”
Section: Radiation Studiesmentioning
confidence: 99%