“…When the samples were annealed above 1400 °C, the surface was protected with a carbon cap to avoid Si evaporation [30]. After the annealing, the carbon cap was removed by oxidation at 1000 °C for 1 h. DLTS measurements were performed in the temperature range from 150 K to 700 K. As reported [28,[31][32][33], both Z 1/2 and EH 6/7 centers are thermally very stable, and the concentrations start to decrease at annealing temperature higher than 1500-1600 °C. On the other hand, hole traps (HK2, HK3, and HK4) are almost annealed out at 1550 °C.…”