2019 IEEE 46th Photovoltaic Specialists Conference (PVSC) 2019
DOI: 10.1109/pvsc40753.2019.8980875
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Radiation Effects in Thinned GaAs Photovoltaics Incorporating DBRs for Improved Radiation Tolerance of Multijunctions

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Cited by 6 publications
(6 citation statements)
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“…However, increasing the absorbed light is more challenging for multi-junction than for single junction cells; the optical structure has to be placed behind the junction which absorbs the least light, otherwise the subsequent junctions-having a lower bandgap-will absorb the incoming photons. This problem has restricted the strategies for compensating the thinning of the middle junction to using distributed Bragg reflectors (DBRs) between the middle and the bottom subcells [4,8,14]. These reflective elements are employed in conjunction with a front surface antireflective coating (ARC).…”
Section: Introductionmentioning
confidence: 99%
“…However, increasing the absorbed light is more challenging for multi-junction than for single junction cells; the optical structure has to be placed behind the junction which absorbs the least light, otherwise the subsequent junctions-having a lower bandgap-will absorb the incoming photons. This problem has restricted the strategies for compensating the thinning of the middle junction to using distributed Bragg reflectors (DBRs) between the middle and the bottom subcells [4,8,14]. These reflective elements are employed in conjunction with a front surface antireflective coating (ARC).…”
Section: Introductionmentioning
confidence: 99%
“…Lowering the thickness can also offer better performance in cells that are grown in ways that do not necessarily ensure high crystalline quality, such as hydride vapor phase epitaxy (HVPE) 1,2 or III‐V on silicon (III‐V/Si), 3 which both have the potential to reduce costs of III‐V cells even further. Ultrathin cells are also less affected by proton and electron radiation induced defects 4–6 and can potentially achieve a higher open‐circuit voltage ( V OC ) than thicker structures 7 …”
Section: Introductionmentioning
confidence: 99%
“…Lowering the thickness can also offer better performance in cells that are grown in ways that do not necessarily ensure high crystalline quality, such as hydride vapor phase epitaxy (HVPE) 1,2 or III-V on silicon (III-V/Si), 3 which both have the potential to reduce costs of III-V cells even further. Ultrathin cells are also less affected by proton and electron radiation induced defects [4][5][6] and can potentially achieve a higher open-circuit voltage (V OC ) than thicker structures. 7 With a suitable light-trapping scheme increasing the path length through the solar cell, the ultrathin structures can be made optically thick and achieve current-densities matching those of conventional thin film (2-3 μm) GaAs cells.…”
Section: Introductionmentioning
confidence: 99%
“…While, distributed Bragg reflectors (DBR) can be introduced into thin film solar cell to improve EQE when the MCDL is not long enough. [18][19][20][21] The main reason for this is that incident photons with a specific wavelength range can be absorbed twice by the base layer when DBR structure is placed under the back side of solar cell, and the material thickness can be designed thinner than that without DBR. Therefore, DBR is very suitable for GaInNAs solar cell due to the shorter MCDL, especially as it is prepared by MOVPE technology.…”
mentioning
confidence: 99%