2022
DOI: 10.1149/2162-8777/ac8bf7
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Radiation Damage in the Ultra-Wide Bandgap Semiconductor Ga2O3

Abstract: Ga2O3 is expected to show similar radiation resistance to that of GaN and SiC. This is not enough to explain the orders of magnitude difference in the relative resistance to radiation damage of these materials compared to GaAs or why dynamic annealing of defects is much more effective in Ga2O3. Octahedral gallium monovacancies are the main defects produced under most radiation conditions because of the larger cross-section for interaction compared to oxygen vacancies. Proton irradiation introduces two main pa… Show more

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Cited by 18 publications
(16 citation statements)
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References 119 publications
(143 reference statements)
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“…Since the NIEL is approximately constant over the drift layer thickness, this provides a reasonable estimate the carrier removal rate. The values obtained here for the NiO/Ga 2 O 3 , 1200 for 10 13 cm −2 and 190 cm −1 for 10 14 cm −2 are consistent with values reported for proton irradiation at similar energies/fluences but in Schottky diode structures that did not include the NiO [26,27]. This indicates that in contrast to gamma irradiation [29], the heterojunction rectifiers do not show any significant differences with the presence of the NiO for proton damage.…”
Section: Resultssupporting
confidence: 89%
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“…Since the NIEL is approximately constant over the drift layer thickness, this provides a reasonable estimate the carrier removal rate. The values obtained here for the NiO/Ga 2 O 3 , 1200 for 10 13 cm −2 and 190 cm −1 for 10 14 cm −2 are consistent with values reported for proton irradiation at similar energies/fluences but in Schottky diode structures that did not include the NiO [26,27]. This indicates that in contrast to gamma irradiation [29], the heterojunction rectifiers do not show any significant differences with the presence of the NiO for proton damage.…”
Section: Resultssupporting
confidence: 89%
“…The carrier removal rate per ion was then obtained from the change in carrier density divided by the fluence and is included in the compilation plot of figure 8, which shows the published values for different polymorphs of Ga 2 O 3 irradiated with different forms of radiation [26,27]. Since the NIEL is approximately constant over the drift layer thickness, this provides a reasonable estimate the carrier removal rate.…”
Section: Resultsmentioning
confidence: 99%
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“…These are expected to be similar since the depletion in the both the p-n heterojunctions and the Schottky rectifier will be in the n-Ga 2 O 3 . As tabulated in Table I, the carrier concentration is slightly reduced after neutron irradiation, with an approximate carrier removal rate, R C , defined by 44,45 where Φ is the neutron fluence, n s0 is initial carrier concentration, and n s is the irradiated carrier concentration. The R C value was ∼45 cm −1 , which is broadly consistent with reported values for neutrons with similar or lower energies, given the large uncertainties in some cases of this parameter.…”
Section: Resultsmentioning
confidence: 99%
“…38 While neutrons are the least damaging from this regard, their ubiquity in the environment means there is a need to understand their effects on Ga 2 O 3 -based devices. [41][42][43][44][45] In this paper, we report a comparison of 10 MeV neutron irradiation of NiO/Ga 2 O 3 heterojunction rectifiers with conventional Schottky Ga 2 O 3 rectifiers. We find no significant difference in the response of the two types of rectifiers to neutron irradiation, and a high degree of robustness against neutron damage in both cases.…”
mentioning
confidence: 99%