2020
DOI: 10.1016/j.nima.2020.164435
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Radiation damage effects on double-SOI pixel sensors for X-ray astronomy

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Cited by 10 publications
(8 citation statements)
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“…This increased parasitic capacitance is quantitatively consistent with that expected from the observed gain decrease of the DSOI XRPIX. 10 According to the previous study on the DSOI XRPIX, 10 the inverse of the gain G changes with the parasitic capacitance of the sense node C SN as…”
Section: Gainmentioning
confidence: 98%
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“…This increased parasitic capacitance is quantitatively consistent with that expected from the observed gain decrease of the DSOI XRPIX. 10 According to the previous study on the DSOI XRPIX, 10 the inverse of the gain G changes with the parasitic capacitance of the sense node C SN as…”
Section: Gainmentioning
confidence: 98%
“…For a comparison under the same condition, data from PDD XRPIX are plotted only below 6.5 krad, which is the maximum total dose of the proton irradiation experiment of DSOI XRPIX. 10 Both results of PDD and DSOI are fitted with linear functions in this dose range. According to the fitting, after the 4-krad irradiation, the energy resolution of the DSOI device is degraded by 7.0 ± 2.5 %, whereas that of the PDD device remains constant within 1%.…”
Section: Comparison With Dsoimentioning
confidence: 99%
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“…These two layers are separated by a buried oxide layer, which enables thin substrate thicknesses and small pitches with low capacitance [9]. However, these devices suffer from high sensitivity to radiation mainly due to the accumulation of positive oxide charges in the buried oxide layer [10].…”
Section: Introductionmentioning
confidence: 99%
“…SOI sensors embed a buried-oxide layer separating a thin low-resistivity silicon layer, which hosts the integrated readout circuitry, from a thicker high-resistivity substrate, which serves as the sensitive detection region [ 16 , 17 ]. This technology allows a low capacitance to be obtained [ 17 ]; however, SOI sensors suffer from back-gate effect and have a reduced radiation hardness, due to accumulation of positive holes charges in the buried oxide layer after irradiation [ 18 ]. Strategies have been found to overcome these limitations and to recover from the Total Ionizing Dose (TID) [ 19 ], but, as a consequence, the fabrication process of SOI sensors have become highly specialized and not compliant with standard microelectronics production processes.…”
Section: Introductionmentioning
confidence: 99%