1999
DOI: 10.1002/(sici)1097-0126(199910)48:10<1053::aid-pi268>3.0.co;2-t
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Radiation chemistry of polymeric materials: novel chemistry and applications for microlithography

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Cited by 39 publications
(20 citation statements)
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“…(a) (b) Figure 1: The 1 H (a) and 13 C NMR (b) spectra of the polymer II A Observably, the 1 H NMR spectrum of II A polymer (Fig 1a) exhibits the proton resonance signals with low resolution. The methylene group (-OCH 2 -) at 4.09 and 4.02 ppm is contributed to H a and H f protons.…”
Section: Nmr Spectra Of Polymersmentioning
confidence: 99%
See 1 more Smart Citation
“…(a) (b) Figure 1: The 1 H (a) and 13 C NMR (b) spectra of the polymer II A Observably, the 1 H NMR spectrum of II A polymer (Fig 1a) exhibits the proton resonance signals with low resolution. The methylene group (-OCH 2 -) at 4.09 and 4.02 ppm is contributed to H a and H f protons.…”
Section: Nmr Spectra Of Polymersmentioning
confidence: 99%
“…The published results showed that polymers containing chalcone group have the ability to graft among different polymer chains when exposed to UV radiation. [7][8][9] Derived polymers of chalcone are widely applied to various fields such as microscopy, [12][13] photosensitive materials, nonlinear optical materials, [14][15][16] crystal displays liquid. [17][18][19] Byung-Hak Kim et al had produced melanin by the chalcone derivative 1-(2-cyclohexylmethoxy-6hydroxy-phenyl)-3-(4-hydroxymethyl-phenyl)-propenone (chalcone-21) and this chalcone-21 may be a useful anti-melanogenic agent and effective to the treatment of aesthetic problems and hyperpigmentation disorders.…”
Section: Introductionmentioning
confidence: 99%
“…Polymer containing pendant α,β-unsaturated carbonyl groups (also named chalcone groups, e.g., cinnamoyl groups) either in the backbone or as pendant group undergo crosslinking upon irradiation with UV light or an electron beam, and is being used as photoresists in the field of printing technology [4], microlithography [5], non-linear optical materials [6], holographic head-up display [7], liquid crystals [8,9], energy exchange materials [10], etc.…”
Section: Introductionmentioning
confidence: 99%
“…The anhydride units can serve various purposes. Alcoholysis can introduce acid groups which are useful for increasing polarity and thus adhesion properties of resist materials 4. The anhydride groups can react with suitable amino group‐bearing polymers to increase the thickness of the resist layer.…”
Section: Introductionmentioning
confidence: 99%