2019
DOI: 10.1063/1.5098294
|View full text |Cite
|
Sign up to set email alerts
|

Quantum transport in high-quality shallow InSb quantum wells

Abstract: These authors contributed equally to this work. InSb is one of the promising candidates to realize a topological state through proximity induced superconductivity in a material with strong spin-orbit interactions. In two-dimensional systems, thin barriers are needed to allow strong coupling between superconductors and semiconductors. However, it is still challenging to obtain a high-quality InSb two-dimensional electron gas in quantum wells close to the surface. Here we report on a molecular beam epitaxy grown… Show more

Help me understand this report
View preprint versions

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

1
15
0

Year Published

2020
2020
2024
2024

Publication Types

Select...
8
1

Relationship

1
8

Authors

Journals

citations
Cited by 23 publications
(20 citation statements)
references
References 34 publications
1
15
0
Order By: Relevance
“…1 (g), the carrier density can be tuned from 2 × 10 JJ cm K8 to 3.5 × 10 JJ cm K8 while increasing the mobility from 1.3 × 10 5 cm 8 /(Vs) to 3 × 10 5 cm 8 /(Vs). The gate capacitance is estimated to be C = 0.32 mF/m 2 at the linear part of the n-VTG line, which is about 40% less than the value calculated from the plane-parallel capacitor model, which is similar to the results of our previous work [23].…”
supporting
confidence: 85%
See 1 more Smart Citation
“…1 (g), the carrier density can be tuned from 2 × 10 JJ cm K8 to 3.5 × 10 JJ cm K8 while increasing the mobility from 1.3 × 10 5 cm 8 /(Vs) to 3 × 10 5 cm 8 /(Vs). The gate capacitance is estimated to be C = 0.32 mF/m 2 at the linear part of the n-VTG line, which is about 40% less than the value calculated from the plane-parallel capacitor model, which is similar to the results of our previous work [23].…”
supporting
confidence: 85%
“…The micro-fabrication process is similar to our previous work [23]. A standard Hall bar sample is defined using wet chemical etching with an etching depth of more than 270 nm, which is deeper than the Si δ-doping layer on the substrate side.…”
mentioning
confidence: 99%
“…The equivalent mobilities for the CdTe shell and uncapped InSb nanowires indicate that the shell does not induce additional disorder to the InSb nanowires, thereby preserving the InSb nanowire properties. Possibly, thicker shells ( > 12 nm) are required to passivate the nanowire surface and further confine the electrons in the nanowire, similar to InSb quantum wells, where relatively thick barrier layers ( > 50 nm) are needed to achieve high mobility 42 . Nevertheless, thicker shells would not be compatible with a tunnel barrier at the interface between a semiconducting nanowire and a superconductor, seeing as the tunneling probability decreases exponentially with barrier thickness.…”
Section: Electric Characterization Of the Insb-cdte Core-shell Nanowiresmentioning
confidence: 99%
“…However, to build a device in which braiding of topological quantum states, such as Majorana fermions, can be conveniently performed and thus topological quantum computations can be designed and realized, it could be inevitable to move from single-nanowire structures to multiple-nanowire 20,21 and twodimensional (2D) planar quantum structures [22][23][24] . Recently, highquality InSb/InAlSb heterostructured quantum wells 25,26 and freestanding InSb nanosheets [27][28][29][30] have been achieved by epitaxial growth techniques. In comparison with InSb/InAlSb quantum well systems, the free-standing InSb nanosheets have advantages in direct contact by metals, including superconducting materials, in easy transfer to different substrates, and in convenient fabrication of dual-gate structures.…”
Section: Introductionmentioning
confidence: 99%