2018
DOI: 10.1007/s10854-018-9361-0
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Quantum efficiency of heterostructured AlN/AlxGa1−xN photocathodes with graded bandgap emission layer

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Cited by 21 publications
(10 citation statements)
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“…Therefore, from above discussion, it could be known that for Al x Ga 1 − x N monolayer photocathode, the ideal quantum efficiency and photoelectric emission performance can be obtained when buffer layer thickness is about 50 to 75 nm, while the thickness of buffer layer in bulk AlN/Al x Ga 1 − x N photocathodes is about 450 to 550 nm. 26 The distance that electrons travel from buffer layer to surface is shorter in Al x Ga 1 − x N monolayer photocathodes and more electrons would be transported to emission layer.…”
Section: Resultsmentioning
confidence: 99%
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“…Therefore, from above discussion, it could be known that for Al x Ga 1 − x N monolayer photocathode, the ideal quantum efficiency and photoelectric emission performance can be obtained when buffer layer thickness is about 50 to 75 nm, while the thickness of buffer layer in bulk AlN/Al x Ga 1 − x N photocathodes is about 450 to 550 nm. 26 The distance that electrons travel from buffer layer to surface is shorter in Al x Ga 1 − x N monolayer photocathodes and more electrons would be transported to emission layer.…”
Section: Resultsmentioning
confidence: 99%
“…In Equation 3, E g (GaN) is band gap of GaN monolayer with 4.65 eV, E g (AlN) is band gap of AlN monolayer with 9.60 eV, 17,18 and b is set to 0.9. 26 g i (x) is photoelectron generation function in the i-th…”
Section: Theoretical Models and Calculation Methodsmentioning
confidence: 99%
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