1998
DOI: 10.1109/2944.720476
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Quantitative model for the kinetics of compositional intermixing in GaAs-AlGaAs quantum-confined heterostructures

Abstract: A quantitative atomic-scale model for the kinetics of intermixing in GaAs-AlGaAs quantum-confined heterostructures is presented. The model takes into account the statistical nature of the defect diffusion through heterostructures and calculates its effect on the Ga-Al interdiffusion across the associated interfaces. The model has been validated by successfully predicting the observed amounts of bandgap shift induced by the process of hydrogen plasma induced defect layer intermixing, as well as for the process … Show more

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Cited by 8 publications
(7 citation statements)
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References 28 publications
(51 reference statements)
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“…Peyre et al [175] who measured the transition energies of three inter band states (E1-HH1, E1-LH1, E2-HH2) as a function of QWI using the technique of low temperature excitonic reflectivity and 2. Helmy et al [82] who used photoluminescence excitation spectroscopy (PLE) to measure eight (E1-HH1, E1-LH1, E1-HH2, E1-HH3, E2-HH1, E1-LH2, E2-LH1, E2-HH2) inter-band transitions.…”
Section: Discussionmentioning
confidence: 99%
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“…Peyre et al [175] who measured the transition energies of three inter band states (E1-HH1, E1-LH1, E2-HH2) as a function of QWI using the technique of low temperature excitonic reflectivity and 2. Helmy et al [82] who used photoluminescence excitation spectroscopy (PLE) to measure eight (E1-HH1, E1-LH1, E1-HH2, E1-HH3, E2-HH1, E1-LH2, E2-LH1, E2-HH2) inter-band transitions.…”
Section: Discussionmentioning
confidence: 99%
“…Fick's first law (Equation 5.1) states that the rate of transfer F of a diffusing substance through a unit surface area of a plane is proportional to the concentra tion (C) gradient in the direction normal to that plane (z). The proportionality constant is the diffusion coefficient, D. Fick's second law (Equation 5.2) is only valid for the case where D is independent of C. Helmy et al [82] suggest this is not a good assumption for a semiconductor, since the diffusion coefficient is a function of position (^)and concentration (C):…”
Section: Theorymentioning
confidence: 99%
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“…This is due to the introduction of group-III vacancies at the sample/ dielectric interface which have a tendency to interdiffuse species residing on the group-III sublattice only. 7 In the case of the InGaAs/ GaAs MQW the intermixing takes place on the group-III sublattice, while in the InGaAs/ InGaAsP MQWs, because the same group-III composition is used in the wells and barriers the compositional gradient is only on the group-V sublattice and therefore remains intact in the presence of group-III vacancies. Therefore, we conclude that the group-V sublattice is more stable and less likely to interdiffuse at elevated temperatures than the group-III sublattice in samples encapsulated by SiO x N y .…”
mentioning
confidence: 99%
“…However, this assumption would indicate that H 2 O and air in the film pores play a key role in assisting and preventing Ga outdiffusion and hence QWI, respectively. 18 We have demonstrated control of the extent of QWI in various GaAs/AlGaAs heterostructures by exposing the SiO 2 films used in the process of impurity free vacancy disordering to an oxygen plasma, produced by a reactive ion etching machine. Control was observed for doped and undoped GaAs/AlGaAs samples.…”
mentioning
confidence: 99%