1968
DOI: 10.6028/nbs.sp.298
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Quantitative electron probe microanalysis :

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Cited by 26 publications
(16 citation statements)
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“…The presentations are collected in NBS Special Publications [1416] and in a book edited by Heinrich and Newbury [17]. …”
Section: Contributions Of Nbs/nistmentioning
confidence: 99%
“…The presentations are collected in NBS Special Publications [1416] and in a book edited by Heinrich and Newbury [17]. …”
Section: Contributions Of Nbs/nistmentioning
confidence: 99%
“…,27 Based on published BSE data for a large number of pure elements, numerous authors have proposed equations to relate g to atomic number Z 16,[28][29][30][31]. While these various equations give similar data for mid to high values of Z, only Arnal et al…”
mentioning
confidence: 98%
“…The ZAF technique (Goldstein et al, 1981d;Heinrich, 1981e;Henoc and Maurice, 1979b), as summarized thus far, applies to both EDS and WDS. The only calculation difference between the two detection methods is that a curve-fitting scheme is applied to the EDS spectrum prior to obtaining the k-ratio in order to properly subtract the background and isolate any overlapping peaks.…”
Section: Thin Film On Substratementioning
confidence: 99%
“…The basic assumptions made by ZAF, for either EDS or WDS, are that the electron beam is normal to the sample's surface and that the k-ratio is measured from an X-ray generation volume that is entirely contained within a homogeneous material. If the standard and sample are both tilted to the same tilt angle, the k-ratios need to be corrected for the tilt angle before ZAF can correct it properly (Goldstein et al, 1981c;Heinrich, 19810. It is desirable to measure the X-ray K-lines when possible as they are not absorbed as strongly as the low energy L or M-lines. However, often there is a compromise between the required beam energy to perform a bulk analysis on a thin film on a substrate and the energy required to excite the K-line.…”
Section: Thin Film On Substratementioning
confidence: 99%