The pulsed galvanostatic deposition of nanometer-sized Pt particles on electrically conducting microcrystalline and nanocrystalline diamond thin-film electrodes is reported. The deposition was studied as a function of pulse number ͑10-50͒ and current density ͑0.50-1.50 mA cm −2 ͒ at the two morphologically different forms of diamond. The deposition of catalyst particles using ten 1 s pulses ͑duty cycle 50%͒ at a current density of 1.25 mA cm −2 ͑geometric area͒ produced the smallest nominal particle size and the highest particle coverage on both diamond surfaces. Secondary electron micrographs revealed metal particle deposition over much of the diamond surface, a nominal particle size of 43 ± 27 nm ͓relative standard deviation ͑RSD͒ = 63%͔ for microcrystalline and 25 ± 25 nm ͑RSD = 100%͒ for nanocrystalline diamond, and a nominal particle coverage of 7.5 ͑±0.9͒ ϫ 10 9 cm −2 for microcrystalline and 1.9 ͑±1.0͒ ϫ 10 10 cm −2 for nanocrystalline diamond. Deposition under these conditions resulted in the most efficient utilization of the metal catalyst for H + adsorption, based on the electrochemically active Pt area normalized to the estimated metal loading. Typical specific surface areas of 10-50 m 2 /g Pt were calculated, which compare favorably to values obtained at sp 2 electrodes, like carbon and graphite. The influence of the diamond electrode microstructural and electronic properties on the formation of dimensionally uniform metal adlayers is discussed.