Quantitative depth analysis using microsecond pulsed glow discharge atomic emission spectrometry

Oxley, Eric; Yang, Chenglong; Harrison, W. W.

doi:10.1039/b001969k

Cited by 35 publications

(24 citation statements)

References 7 publications

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“…3,4 In addition, the sputtering rate is reduced which renders PGD preferable for the analysis of thin films. [5][6][7][8] The pulsing process initiates different excitation and ionization mechanisms at the beginning, during and after the pulse with strong, medium and soft plasma conditions. [9][10][11] Using this feature and time-of-flight mass spectrometry one can extract elemental and molecular information from gaseous samples.…”

Section: Introductionmentioning

confidence: 99%

Electrical properties of the µs pulsed glow discharge in a Grimm-type source: comparison of dc and rf modes

Efimova

Hoffmann

Eckert

2011

J. Anal. At. Spectrom.

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The electrical properties, in particular the U-I characteristics, current and voltage signal shapes within the pulse, are important parameters for the understanding of the processes taking place in the pulsed glow discharge (PGD). The electrical properties are also closely related to the analytical performance of the PGD such as sputtering rates, crater shapes and emission yields. Moreover, the dependence of the U-I plots on the density of the discharge gas can be used to estimate the gas temperature. This result is relevant for the analysis of thermally fragile samples. Nevertheless, there is a lack of PGD studies where the current and voltage signals are considered in detail. Therefore, this article is dedicated to the electrical properties of PGD. The influence of the PGD parameters (duty cycle and pulse duration) on the electrical properties is examined. The results highlight the optimum parameters for particular analytical applications. The question, whether direct current (dc) and radio frequency (rf) discharges behave similarly is also discussed and all experiments are performed for both modes. The comparative studies reveal strong similarities between dc and rf pulsed discharges.

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Section: Introductionmentioning

confidence: 99%

Electrical properties of the µs pulsed glow discharge in a Grimm-type source: comparison of dc and rf modes

Efimova

Hoffmann

Eckert

2011

J. Anal. At. Spectrom.

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“…At the layer interface, signals arise from both elements due to atomic mixing and GD nonuniformity on the sample surface. By converting sputter time to a corresponding erosion depth, the crossover point in Figure 4 can be used to calculate the thickness of the initial layer (14).…”

Section: P Pu Ul Ls Se Ed D G Gd D P Pr Ro Op Pe Er Rt Ti Ie Es Smentioning

confidence: 99%

Peer Reviewed: Pulsed Glow Discharge: Temporal Resolution in Analytical Spectroscopy

Harrison¹,

Yang²,

Oxley³

2001

Anal. Chem.

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Atom density decreases as the black fades to orange. (a) dc mode. The device consists of a negative cathode and a grounded anode immersed in a low-pressure rare gas, usually argon. A potential (V) breaks down the discharge fill gas, yielding Ar + that is attracted to the cathode-which, in this case, is the sample. The ions collisionally sputter neutral atoms from the surface into the adjacent GD plasma. As these sputtered atoms diffuse through the GD plasma, collisions with electrons, ions, and metastable atoms excite and ionize the sample atoms. (b) Pulsed mode operates on the same principles described for dc mode, but in short, repetitive dc pulses.

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“…Depending on the application, different techniques such as Auger electron spectroscopy (AES) [1,2], X-ray photoelectron spectroscopy (XPS) [3,4], secondary ion mass spectrometry (SIMS) [5,6] and glow discharge optical emission spectrometry (GD-OES) and mass spectrometry (GD-MS) [7][8][9][10] are used. Different limitations, such as restriction of sample shape or nature, long time required for analysis, poor lateral resolution and etc.…”

Section: Introductionmentioning

confidence: 99%

“…Influence of copper foil thickness(10,20,30, and 50 μm) on (a) P 0.5 , (b) AAR and (c) Δz for two cases of I N (open symbols) and C N (filled symbols) depth profiles shown inFig. 1.…”

mentioning

confidence: 99%

Numerical and experimental depth profile analyses of coated and attached layers by laser-induced breakdown spectroscopy

Ardakani

Tavassoli

2010

Spectrochimica Acta Part B: Atomic Spectroscopy

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Quantitative depth analysis using microsecond pulsed glow discharge atomic emission spectrometry

Cited by 35 publications

References 7 publications

Electrical properties of the µs pulsed glow discharge in a Grimm-type source: comparison of dc and rf modes

Electrical properties of the µs pulsed glow discharge in a Grimm-type source: comparison of dc and rf modes

Peer Reviewed: Pulsed Glow Discharge: Temporal Resolution in Analytical Spectroscopy

Numerical and experimental depth profile analyses of coated and attached layers by laser-induced breakdown spectroscopy

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