Quantitative characterization of occupational sites of implanted P atoms in diamond

Abstract

The authors implanted P atoms at 50 and 140-keV energies with respective fluences of 1×1014 and 2×1014/cm2 into diamond thin films synthesized by chemical vapor deposition on the type-Ib diamond substrate formed by high-pressure and high-temperature conditions. The occupational sites of implanted P atoms were determined in each processing stage of P implantation, ion-beam-induced epitaxial crystallization (IBIEC) annealing by 3-MeV-Ne2+ ion irradiation at 750°C, and thermal annealing at 850°C in vacuum, by quantitatively comparing the random and channeling yields in Rutherford backscattering (RBS) measurements. In the analysis of RBS spectra, simulated distributions were fitted to the experimentally obtained spectra and we quantitatively identified the occupational sites and ratio of implanted P atoms. In addition, we investigated the diffusion phenomenon of implanted P atoms during annealing processes from the depth profile of scattered He ions. Consequently, the averaged occupational ratio in the substitutional lattice site was stably recorded around 50%. From the depth profile in the RBS spectra, thermal diffusion of implanted P atoms was clearly observed during the last thermal annealing after MeV-IBIEC annealing. We finally discuss the potentials of the MeV-IBIEC irradiation at relatively low temperatures applying to useful and credible annealing methods for electrical activation as well as recovery of damaged crystallinity.