Quantifying throughput improvements for electron-beam lithography using a suite of benchmark patterns

Hartley, John G.; Crosland, Nigel; Dowling, Robert C.; Hoyle, P. C.; McClelland, Andrew; Turnidge, Martin; Smith, James H.

doi:10.1117/12.2011664

Alternative Lithographic Technologies V 2013

DOI: 10.1117/12.2011664

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Quantifying throughput improvements for electron-beam lithography using a suite of benchmark patterns

John G. Hartley

Nigel Crosland²,

Robert C. Dowling³

et al.

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Quantifying throughput improvements for electron-beam lithography using a suite of benchmark patterns

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