Abstract:Area-selective deposition (ASD) shows great promise for sub-10 nm manufacturing in nanoelectronics, but significant challenges remain in scaling to ultrasmall dimensions and understanding feature-dependent nonuniformity and selectivity loss. This work addresses these problems by simultaneously quantifying uniformity and selectivity for passivation/deposition/etch supercycles in 45 nm half-pitch TiN/SiO 2 line/space patterns. This work employs three selective processes that are uniquely suited for supercycle pr… Show more
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