2021
DOI: 10.1017/s1431927621000568
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Quantification of Trace-Level Silicon Doping in AlxGa1–xN Films Using Wavelength-Dispersive X-Ray Microanalysis

Abstract: Wavelength-dispersive X-ray (WDX) spectroscopy was used to measure silicon atom concentrations in the range 35–100 ppm [corresponding to (3–9) × 1018 cm−3] in doped Al x Ga1–xN films using an electron probe microanalyser also equipped with a cathodoluminescence (CL) spectrometer. Doping with Si is the usual way to produce the n-type conducting layers that are critical in GaN- and Al x Ga1–xN-based devices such as LEDs and laser diodes. Previously, we have shown excellent agreement for M… Show more

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“…For estimating the Si concentration, a calibration method was used. The method involves measuring the Si intensity of all samples and comparing with Al x Ga 1-x N and GaN reference samples for which Si concentration was known from secondary ion mass spectrometry (SIMS) analysis [37,38]. Doping densities evaluated by this method are in the of range 10 17 -10 19 cm −3 .…”
Section: Methodsmentioning
confidence: 99%
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“…For estimating the Si concentration, a calibration method was used. The method involves measuring the Si intensity of all samples and comparing with Al x Ga 1-x N and GaN reference samples for which Si concentration was known from secondary ion mass spectrometry (SIMS) analysis [37,38]. Doping densities evaluated by this method are in the of range 10 17 -10 19 cm −3 .…”
Section: Methodsmentioning
confidence: 99%
“…Doping densities evaluated by this method are in the of range 10 17 -10 19 cm −3 . The concentration determined directly from the WDX are over-estimated, likely as a result of surface contamination [38].…”
Section: Methodsmentioning
confidence: 99%