“…Plasma immersion Ion implantation was carried out using a dielectric barrier discharge (DBD) apparatus described elsewhere. [
9 ] Nitrogen gas was used at a pressure of 500 mTorr, with the DBD powered by a Rup‐6 switch‐mode pulsed power supply (Elektroteknik GmBH Germany) with a square wave amplitude of −10kV, a square wave amplitude of −10kV, 40
s pulse width and 1 kHz frequency with a pulse rise time of ~220–250 ns. The PEEK sheets were subjected to PIII treatment for treatment times of 0, 0.5, 1, 2, 5, 10, 15, 20, and 30 min, to give a set of ion fluences on the surface of each PEEK sheet proportional to treatment time.…”