2014
DOI: 10.1117/12.2074473
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Qualification of local advanced cryogenic cleaning technology for 14nm photomask fabrication

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Cited by 2 publications
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“…As discovered, these methods proved to be viable but have also some limitations, related to the rapid decrease of the local temperature and the mechanical strength of the jet which can contribute to the surface damage of the more sensitive materials [25]. To minimize the potential damage, the less aggressive cleaning conditions with lower but still acceptable efficiency of particle removal could be used [30]. Therefore, to avoid possible physical damage, tests are needed prior to the application of any of these methods.…”
Section: Introductionmentioning
confidence: 99%
“…As discovered, these methods proved to be viable but have also some limitations, related to the rapid decrease of the local temperature and the mechanical strength of the jet which can contribute to the surface damage of the more sensitive materials [25]. To minimize the potential damage, the less aggressive cleaning conditions with lower but still acceptable efficiency of particle removal could be used [30]. Therefore, to avoid possible physical damage, tests are needed prior to the application of any of these methods.…”
Section: Introductionmentioning
confidence: 99%
“…As found these methods proved to be viable but have also some limitations, related to the fast decrease of the local temperature and the mechanical strength of the jet which can contribute to the surface damage of the more sensitive materials [24]. To minimize the potential damage the less agressive cleaning conditions with lower but still acceptable efficiency of particle removal could be used [26].…”
Section: Introductionmentioning
confidence: 99%