2020
DOI: 10.3390/electronics9122086
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Q-Factor Performance of 28 nm-Node High-K Gate Dielectric under DPN Treatment at Different Annealing Temperatures

Abstract: Q-factor is a reasonable index to investigate the integrity of circuits or devices in terms of their energy or charge storage capabilities. We use this figure of merit to explore the deposition quality of nano-node high-k gate dielectrics by decoupled-plasma nitridation at different temperatures with a fixed nitrogen concentration. This is very important in radio-frequency applications. From the point of view of the Q-factor, the device treated at a higher annealing temperature clearly demonstrates a better Q-… Show more

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Cited by 14 publications
(6 citation statements)
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“…The non-linear solution of Equation ( 5) is expressed as The speed of the electron, closely associated with current density (J=nev), is proportional to the derivative of the wave function with respect to ξ. (7) Therefore, the fine variations of IDS in Figure 3a are to be easier modified by using the above Gaussian form, followed by Figure 3b with less minimum delta. The final fitting curves are then as shown in Figure 3c.…”
Section: The Kink Effectmentioning
confidence: 99%
See 1 more Smart Citation
“…The non-linear solution of Equation ( 5) is expressed as The speed of the electron, closely associated with current density (J=nev), is proportional to the derivative of the wave function with respect to ξ. (7) Therefore, the fine variations of IDS in Figure 3a are to be easier modified by using the above Gaussian form, followed by Figure 3b with less minimum delta. The final fitting curves are then as shown in Figure 3c.…”
Section: The Kink Effectmentioning
confidence: 99%
“…Nevertheless, ones are still intrigued to know if the "modified" conventional formula is applicable for fitting repeated characteristic curves. [1][2][3][4][5][6][7][8][9][10][11][12][13][14] In the model, useful parameters are supposed to be constants even though they need interpreting. Some evidences in this paper do show some limitation.…”
Section: Introductionmentioning
confidence: 99%
“…The achievable function of the process is mostly due to the good conformality (step coverage) of chemical vapor deposition, in which SiH4 (silane) is controlled at a chosen flow rate and the ambient is sustained at an appropriate temperature and at certain pressure to achieve a good deposition rate in kinetic regime. [7][8][9][10][11][12][13][14][15] Somehow, the electrical performances of transistors are mainly manifested in current-versusvoltage characteristic curves. Those curves are necessarily parameter-extracted in the model, which is useful to develop circuit design.…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, current-versus-voltage characteristic curves showing the electrical performances of transistors are necessarily parameter-extracted in the model. Nevertheless, researchers are still intrigued to know if the "modified" conventional formula is applicable for fitting repeated characteristic curves [1][2][3][4][5][6][7][8][9][10][11][12][13][14]. Useful parameters are supposed to be constants in the model, even though they need interpreting.…”
Section: Introductionmentioning
confidence: 99%