Pyrolysis of monodisperse poly-alpha-methylstyrene

Roestamsjah,; Wall, Leo A.; Florin, R. E.; Aldridge, Mary H.; Fetters, Lewis J.

doi:10.6028/jres.083.024

Cited by 12 publications

(1 citation statement)

References 12 publications

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“…The hydroxyl functionality of PHOST allows for photochemical crosslinking when blended with photoacid generators and crosslinkers, which is chemistry known to the lithography community for many years. [14] The minority block in our system is poly(α-methylstyrene), which can be thermally removed via its low (61 °C) ceiling temperature [15] using a combination of heat, high vacuum (10 -7 mTorr) and 365 nm UV radiation. Thus, after processing the film microdomain orientation using solvent annealing (discussed in the next section), we are able to pattern and develop thin block copolymer films using traditional lithography, and then use a dry development step to create nanopores of sub-lithographic resolution within the crosslinked areas.…”

Section: Introduction To Chemically Amplified Block Copolymer Lithogrmentioning

confidence: 99%

New self-assembly strategies for next generation lithography

et al. 2010

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Future demands of the semiconductor industry call for robust patterning strategies for critical dimensions below twenty nanometers. The self assembly of block copolymers stands out as a promising, potentially lower cost alternative to other technologies such as e-beam or nanoimprint lithography. One approach is to use block copolymers that can be lithographically patterned by incorporating a negative-tone photoresist as the majority (matrix) phase of the block copolymer, paired with photoacid generator and a crosslinker moiety. In this system, poly(-methylstyrene-block-hydroxystyrene)(PMS-b-PHOST), the block copolymer is spin-coated as a thin film, processed to a desired microdomain orientation with long-range order, and then photopatterned. Therefore, selfassembly of the block copolymer only occurs in select areas due to the crosslinking of the matrix phase, and the minority phase polymer can be removed to produce a nanoporous template. Using bulk TEM analysis, we demonstrate how the critical dimension of this block copolymer is shown to scale with polymer molecular weight using a simple power law relation. Enthalpic interactions such as hydrogen bonding are used to blend inorganic additives in order to enhance the etch resistance of the PHOST block. We demonstrate how lithographically patternable block copolymers might fit in to future processing strategies to produce etch-resistant self-assembled features at length scales impossible with conventional lithography.

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Section: Introduction To Chemically Amplified Block Copolymer Lithogrmentioning

confidence: 99%

New self-assembly strategies for next generation lithography

et al. 2010

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Entropisch bedingte Selektivität der Kettenspaltung oder: Wo Makromoleküle sich trennen

et al. 2015

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Wir zeigen, dass bei Beibehaltung aller anderen Bedingungen ein Bindungsbruch in der Mitte von Molekülen entropisch wesentlich bevorzugter abläuft als ein Bindungsbruch in endständiger Position. Vielfältige experimentelle wie theoretische Ansätze wurden genutzt, um die Selektivität des Bindungsbruchs oder der Dissoziation von in der Mitte oder am Ende des Moleküls kovalent oder supramolekular verbundener Addukte zu untersuchen. Die weitreichenden Auswirkungen auf andere Bereiche der Chemie, wie beispielsweise Kettentransferreaktionen, Polymerdegradation oder die Addition von Kontrollagenzien, werden diskutiert. Die beobachteten Effekte, welche auf entropische Faktoren zurückzuführen sind, wurden auf der Grundlage von einfachen theoretischen Modellen vorhergesagt und mittels Hochtemperatur(HT)‐NMR‐Spektroskopie von selbstorganisierten, supramolekularen Diblocksystemen sowie temperaturabhängiger Größenausschlusschromatographie (TD SEC) von kovalent verknüpften Diels‐Alder‐Stufenwachstumspolymeren überprüft.

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Entropy‐Driven Selectivity for Chain Scission: Where Macromolecules Cleave

et al. 2015

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We show that, all other conditions being equal, bond cleavage in the middle of molecules is entropically much more favored than bond cleavage at the end. Multiple experimental and theoretical approaches have been used to study the selectivity for bond cleavage or dissociation in the middle versus the end of both covalent and supramolecular adducts and the extensive implications for other fields of chemistry including, e.g., chain transfer, polymer degradation, and control agent addition are discussed. The observed effects, which are a consequence of the underlying entropic factors, were predicted on the basis of simple theoretical models and demonstrated via high-temperature (HT) NMR spectroscopy of self-assembled supramolecular diblock systems as well as temperature-dependent size-exclusion chromatography (TD SEC) of covalently bonded Diels-Alder step-growth polymers.

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Pyrolysis of monodisperse poly-alpha-methylstyrene

Cited by 12 publications

References 12 publications

New self-assembly strategies for next generation lithography

New self-assembly strategies for next generation lithography

Entropisch bedingte Selektivität der Kettenspaltung oder: Wo Makromoleküle sich trennen

Entropy‐Driven Selectivity for Chain Scission: Where Macromolecules Cleave

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