Pushing the boundaries of local oxidation nanolithography: Short timescales and high speeds

Vicary, JA; Miles, Mervyn J

doi:10.1016/j.ultramic.2008.04.061

Cited by 24 publications

(15 citation statements)

References 18 publications

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“…© [Payton] The size of the structure is dependent on the number of oxyanions produced. This number is proportional to the amount of time the tip is at any given location and the bias voltage between the tip and surface as described by Vicary et al 241 By pulsing the tip bias on at the same location in the frame as a HS-AFM scans, a surface structure can be written in real-time. The process depends on the ambient fluid layers on the sample and tip.…”

Section: Fabrication Of Nanostructuresmentioning

confidence: 99%

High-speed atomic force microscopy for materials science

Payton

Picco

Scott

2016

International Materials Reviews

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Since its inception in 1986, the field of atomic force microscopy (AFM) has enabled surface analysis and characterisation with unparalleled resolution in a wide variety of environments. However, the technique is limited by very low sample throughput and temporal resolution making it impractical for materials science research on macro sized or time evolving samples such as the observation of corrosion. The potential of AFM sparked intense efforts to overcome these limitations shortly after its invention, and has led to the development of high-speed atomic force microscopes (HS-AFMs). Within the last 5 years the technology underpinning these instruments has matured to the point where routine imaging can achieve megapixels per second over scan areas of square millimetres, removing the limitations from AFM for industrial scale materials characterisation. This review explains the technology and looks to the future use of HS-AFMs in materials science.

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Section: Fabrication Of Nanostructuresmentioning

confidence: 99%

High-speed atomic force microscopy for materials science

Payton

Picco

Scott

2016

International Materials Reviews

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“…Such high conductivities will clear the path to move away from using conducting substrates-which will make fabricating electronic components a challenge-and lead to a much greater magnitude of difference in conductivity between the LEB and ES states. Likewise, increasing the resolution and writespeed of the process through the use of sharper tips and incorporation into high-speed AFMs, [28][29][30][31] as has previously been demonstrated with AFM oxidation of silicon, [ 19,20 ] will allow application of this technique. Areas under current consideration for further exploration include detailed electrochemical studies (also on larger patterned areas), careful exploration of a variety of operating conditions to ensure wide applicability, and controlled fabrication of fundamental electronic components such as nanoscale diodes and transistors.…”

Section: Conductive-afm Patterning Of Organic Semiconductorsmentioning

confidence: 98%

“…[ 17,18 ] This constructive c-AFM redox-writing (cAROW) methodology shows potential for further exploration and development into a scalable, fast write-read technology. [ 19,20 ] The organic semiconductor used in this investigation is based on phenyl/amine-capped tetra(aniline), Ph/NH 2 -TANI , a short-chain, functional, and well-defi ned low molecular weight oligomeric analogue of the well-known conducting polymer, poly(aniline), PANI. Ph/NH 2 -TANI retains the desirable optoelectronic properties of PANI while circumventing the issues of poor solubility, processability, and polydispersity that have previously limited the applications of the polymer.…”

Section: Conductive-afm Patterning Of Organic Semiconductorsmentioning

confidence: 99%

Conductive‐AFM Patterning of Organic Semiconductors

Brown

Picco

Miles

et al. 2015

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local-oxidation nanolithography techniques. [ 17,18 ] This constructive c-AFM redox-writing (cAROW) methodology shows potential for further exploration and development into a scalable, fast write-read technology. [ 19,20 ] The organic semiconductor used in this investigation is based on phenyl/amine-capped tetra(aniline), Ph/NH 2 -TANI , a short-chain, functional, and well-defi ned low molecular weight oligomeric analogue of the well-known conducting polymer, poly(aniline), PANI. Ph/NH 2 -TANI retains the desirable optoelectronic properties of PANI while circumventing the issues of poor solubility, processability, and polydispersity that have previously limited the applications of the polymer. [ 21 ] It is possible to fi ne-tune the optoelectronic properties of tetra(aniline) derivatives, and higher oligomers, simply through modifi cation of the central unit and variation of the end-group functionalization. [ 22 ] Similar to PANI, these oligomeric materials can be reversibly switched (doped) from their conductive emeraldine salt (ES) state to either the nonconductive fully reduced leucoemeraldine base (LEB) or emeraldine base (EB) states through redox, and acid-base chemistry, respectively. [ 23 ] An extensive range of possible inorganic and organic acid dopants exists, with the latter able to simultaneously act as dopants and plasticisers.In this work, N -(4-(((1E,4E)-4-((4-(phenylamino)-phenyl) imino)-cyclohexa-2,5-dien-1-ylidene)amino)phenyl)octanamide ( TANI-C 8 ) doped to the conductive ES state with the prototypical PANI dopant camphorsulfonic acid ( CSA ) was chosen, as this combination formed smooth, continuous thin fi lms on highly oriented pyrolytic graphite (HOPG). Unlike EB-state TANI -based materials, [ 24 ] fi lms prepared from ESstate TANI-C 8 (see the Experimental Section for details) The atomic force microscope (AFM) has developed into a mature and widespread topography characterisation tool since its inception in the 1980s. The high resolution and precision nature of this tool has also led to widespread use, under ambient conditions, for diverse applications. These applications include the direct observation of single-molecule events, [ 1,2 ] molecular force measurements, [ 3,4 ] the fabrication of nanostructures via a variety of nanoscale lithographies, [ 5,6 ] including electrochemical deprotection to yield responsive monolayers, [ 7,8 ] enzymatic oxidative poly merization to locally form conducting polymers, [ 9 ] formation of polymerized sulphur nanostructures, [ 10 ] and direct writing of metallic nanostructures. [ 11 ] These applications were recently classifi ed into mechanical, thermal, diffusive, and electrical processes according to the dominant tip-surface interaction involved. [ 12 ] The last includes probe-based oxidation and reduction lithographies. Although oxidative processes are known, and have been exploited extensively, [13][14][15] reductive processes under ambient conditions are less common.Here we show, in a facile single-step approach, reversible local reductive and oxida...

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“…The sensors must be compact, high-speed, immune to environmental variation, and able to resolve position down to the atomic scale. In many applications, such as atomic force microscopy [1,2] or nanofabrication [3,4], the performance of the machine or process is primarily dependent on the performance of the position sensor, thus, sensor optimization is a foremost consideration.…”

Section: Introductionmentioning

confidence: 99%

“…Capacitive and eddy-current sensors are more complex than strain sensors but can be designed with sub-nanometer resolution, albeit with comparably small range and low bandwidth. They are used extensively in applications such as atomic force microscopy [2,[9][10][11] and nanofabrication [4,12]. The linear variable displacement transformer (LVDT) described in Sect.…”

Section: Introductionmentioning

confidence: 99%

Position Sensors for Nanopositioning

Fleming

Leang

2016

Nanopositioning Technologies

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Position sensors with nanometer resolution are a key component of many precision imaging and fabrication machines. Since the sensor characteristics can define the linearity, resolution, and speed of the machine, the sensor performance is a foremost consideration. The first goal of this article is to define concise performance metrics and to provide exact and approximate expressions for error sources including nonlinearity, drift, and noise. The second goal is to review current position sensor technologies and to compare their performance. The sensors considered include: resistive, piezoelectric, and piezoresistive strain sensors; capacitive sensors; electrothermal sensors; eddy-current sensors; linear variable displacement transformers; interferometers; and linear encoders.

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Pushing the boundaries of local oxidation nanolithography: Short timescales and high speeds

Cited by 24 publications

References 18 publications

High-speed atomic force microscopy for materials science

High-speed atomic force microscopy for materials science

Conductive‐AFM Patterning of Organic Semiconductors

Position Sensors for Nanopositioning

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