Pulsed vacuum and etching systems: Theoretical design considerations for a pulsed vacuum system and its application to XeF2 etching of Si

Mousavi, Arash Kheyraddini; Abbas, Khawar; Elahi, Mirza Mohammad Mahbube; Lima, Edidson; Moya, S.; Butner, Joseph D.; Piñon, Denise; Benga, Adeeko; Mousavi, Behnam Kheyraddini; Leseman, Zayd Chad

doi:10.1016/j.vacuum.2014.07.028

Cited by 7 publications

(4 citation statements)

References 17 publications

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“…The shape of the unit cell in many NALs is inspired by nanostructures seen in nature [1]. Considerable research has been done on characterizing the transmission through NALs with different unit cell shapes resulting from different etching techniques [15] [41] [48]- [52]. However, to the best of our knowledge, in none of the previous works, specific unit cell shape was systematically calculated for achieving a better transmission.…”

Section: Introductionmentioning

confidence: 99%

Nanostructured Anti-Reflection Coatings for Enhancing Transmission of Light

Mousavi¹,

Mousavu²,

Busani³

et al. 2019

JAMP

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Nanostructured, sub-wavelength anti-reflection layers (NALs) have attracted much attention as a new generation of anti-reflection surfaces. Among different designs, sub-wavelength periodic nanostructures are capable of enhancing transmission of coherent light through an interface without inducing scattering. In this work, we have explored a new profile for periodic NALs capable of transmitting IR light with higher efficiency compared to NALs based on a parabolic profile. To achieve high transmission and low diffraction, the profile and pitch of the nanostructured NALs are calculated using a combination of a multi-layer modeling and Rigorous Coupled Wave (RCWA) analysis.available materials with desired refractive indexes. Also, the mismatch between the thermal expansion coefficients of different layers, introduces residual stresses under high power illumination (this is a serious limitation for mechanical stability [6], and for applications like high power laser transmission particularly in the infrared where thicker layers are required) [7] [8].Nanostructured ARC layers (NALs [9]) on the other hand, work by a gradual, adiabatic change of effective refractive index from that of the incidence medium (air) to that of the bulk material (silicon in our case). These structures are also referred as moth-eye structures [10] due to their resemblance to the surface of a moth's eye [11]. In this paper, we will refer to nanostructures designed for re-

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Section: Introductionmentioning

confidence: 99%

Nanostructured Anti-Reflection Coatings for Enhancing Transmission of Light

Mousavi¹,

Mousavu²,

Busani³

et al. 2019

JAMP

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“…The following is a synopsis of the procedure utilized during an etching sequence; a more detailed description is available in [20]. XeF 2 is loaded into the source chamber.…”

Section: Experimental Set Up and Methodologymentioning

confidence: 99%

Determination of etching parameters for pulsed XeF₂etching of silicon using chamber pressure data

Sarkar

Baboly

Elahi

et al. 2018

J. Micromech. Microeng.

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A technique is presented for determination of the depletion of the etchant, etched depth, and instantaneous etch rate for Si etching with XeF2 in a pulsed etching system in real time. The only experimental data required is the pressure data collected temporally. Coupling the pressure data with the knowledge of the chemical reactions allows for the determination of the etching parameters of interest. Using this technique, it is revealed that pulsed etching processes are nonlinear, with the initial etch rate being the highest and monotonically decreasing as the etchant is depleted. With the pulsed etching system introduced in this paper, the highest instantaneous etch rate of silicon was recorded to be 19.5 µm min−1 for an initial pressure of 1.2 Torr for XeF2. Additionally, the same data is used to determine the rate constant for the reaction of XeF2 with Si; the reaction is determined to be second order in nature. The effect of varying the exposed surface area of Si as well as the effect that pressure has on the instantaneous etch rate as a function of time is shown applying the same technique. As a proof of concept, an AlN resonator is released using XeF2 pulses to remove a sacrificial poly-Si layer.

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“…Recently, nanotechnology and nanostructures [6] [7] [8] [9] have solved many problems in technology introducing materials [10] that exhibit special characteristics electrically, mechanically [11]- [15] and when they're under illuminations of light [6] [7] [16] [17]. Fabrication method of these nanomaterials [6] [18] [19] usually depends on the type of the materials and the physical characteristics they're designed for.…”

Section: Introductionmentioning

confidence: 99%

Optimizing Motheye Nanostructures and Achieving 100% Transmission

Mousavi¹,

Talarposhti²

2020

JAMP

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Nanostructured Antireflections Layers (NALs) are a promising substitute for conventional antireflection layers. In the nature, such structures have long existed on insects' eyes. Here, we have derived a general form of mathematical relation that generates a profile close to that of surface of a Moth's eye. By properly designing NALs over dielectric, light has been efficiently transmitted through our high index nanostructures with minimal reflection. The parameters determining the transmission efficiency are the pitch and the profile of the periodic nanostructures. By optimizing the profile, we have designed NALs with transmission reaching 100%. Our periodic structures have minimal dependence on the pitch. This makes it possible to fabricate NALs with the very broadband transmission, without inducing diffraction to lower wavelengths of the transmitted light. Also, our periodic NALs make it possible to transmit laser lights without scattering.

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Pulsed vacuum and etching systems: Theoretical design considerations for a pulsed vacuum system and its application to XeF2 etching of Si

Cited by 7 publications

References 17 publications

Nanostructured Anti-Reflection Coatings for Enhancing Transmission of Light

Nanostructured Anti-Reflection Coatings for Enhancing Transmission of Light

Determination of etching parameters for pulsed XeF₂etching of silicon using chamber pressure data

Optimizing Motheye Nanostructures and Achieving 100% Transmission

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Pulsed vacuum and etching systems: Theoretical design considerations for a pulsed vacuum system and its application to XeF2 etching of Si

Cited by 7 publications

References 17 publications

Nanostructured Anti-Reflection Coatings for Enhancing Transmission of Light

Nanostructured Anti-Reflection Coatings for Enhancing Transmission of Light

Determination of etching parameters for pulsed XeF2etching of silicon using chamber pressure data

Optimizing Motheye Nanostructures and Achieving 100% Transmission

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Product

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Determination of etching parameters for pulsed XeF₂etching of silicon using chamber pressure data