“…Velocity of reaction wave propagation versus the period of the multilayer structure (total thickness of two adjacent layers): 1) Ti/Al film, T0 = 473 K, and spark ignition[99]; 2) Ta/Al film, T0 = 473 K, ignition by a heated tungsten wire[99]; 3) Ni/Al film after deposition, T0 = 298 K[98]; 4) Ni/Al film after annealing at 423 K during 90 min[98]; 5) Ni/Al film after annealing at 423 K during 6 h [98]; 6) Ni/Al film after annealing at 423 K during 24 h[98]; 7) 2Ni/Si film with a total thickness of 1.62 μm, T0 = 298 K, laser ignition[102]; 8) 2Ni/Si film with a total thickness of 0.73 μm, T0 = 298 K, laser ignition[102]; 9) Pt/Al film, T0 = 298 K, laser ignition[100]; 10) Nb/Si film, T0 = 298 K[103]; 11) Co/Al film with a total thickness of 7.5 μm[101].…”