2019
DOI: 10.1016/j.apsusc.2019.02.220
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Pulsed laser deposition of thin carbon films on SiO2/Si substrates

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Cited by 14 publications
(10 citation statements)
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“…A short presentation of all deposited films (specimens C1, C2, P1 and P2) with description of the corresponding PLD process parameters as well as numerical results from the different characterization methods used in this work are given in table 1. The characterization process details and results can be found elsewhere [12]. It could be concluded from the characterization results that: i) C1 films consist of nanosized few-layered (5 -8 layers) graphene flakes with an area of about 3 -5 nm and a completely arbitrary orientation with reference to each other.…”
Section: Resultsmentioning
confidence: 97%
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“…A short presentation of all deposited films (specimens C1, C2, P1 and P2) with description of the corresponding PLD process parameters as well as numerical results from the different characterization methods used in this work are given in table 1. The characterization process details and results can be found elsewhere [12]. It could be concluded from the characterization results that: i) C1 films consist of nanosized few-layered (5 -8 layers) graphene flakes with an area of about 3 -5 nm and a completely arbitrary orientation with reference to each other.…”
Section: Resultsmentioning
confidence: 97%
“…Specimens C1 and C2 were deposited using continuous mode PLD for 180 s and 30 s deposition time, respectively -see ref. [12] for more details. Electro-physical measurements were conducted on all four types of specimens.…”
Section: Methodsmentioning
confidence: 99%
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“…Though these works used various types of materials, they chose the same facile way to prepare the nanostructure by using arrays as a core and high-quality materials as a shell. PLD is a powerful tool for depositing thin films with great precision in thickness and quality at a controllable laser intensity and frequency. The high-quality target and feathering deposition process of PLD endorse the perfect ability to produce conformal ultrahigh-quality films under a low temperature.…”
Section: Introductionmentioning
confidence: 99%