2018
DOI: 10.3390/coatings9010019
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Pulsed Laser Deposition of Indium Tin Oxide Thin Films on Nanopatterned Glass Substrates

Abstract: Indium tin oxide (ITO) thin films were grown on nanopatterned glass substrates by the pulsed laser deposition (PLD) technique. The deposition was carried out at 1.2 J/cm2 laser fluence, low oxygen pressure (1.5 Pa) and on unheated substrate. Arrays of periodic pillars with widths of ~350 nm, heights of ~250 nm, and separation pitches of ~1100 nm were fabricated on glass substrates using UV nanoimprint lithography (UV-NIL), a simple, cost-effective, and high throughput technique used to fabricate nanopatterns o… Show more

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Cited by 37 publications
(33 citation statements)
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“…7 c) and nano-patterned (Fig. 7 d) glass substrates present a characteristic band of this oxide overlapped on the one linked to the glass with the maximum at ~ 410 nm 25 . Regardless the substrates, only the PL spectra of the uracil films reveal its characteristic emission band with maximum at ~ 510 nm, assigned to the de-excitation from the first triplet excited state T 1 to ground state S 0 , as a shoulder (Fig.…”
Section: Resultsmentioning
confidence: 90%
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“…7 c) and nano-patterned (Fig. 7 d) glass substrates present a characteristic band of this oxide overlapped on the one linked to the glass with the maximum at ~ 410 nm 25 . Regardless the substrates, only the PL spectra of the uracil films reveal its characteristic emission band with maximum at ~ 510 nm, assigned to the de-excitation from the first triplet excited state T 1 to ground state S 0 , as a shoulder (Fig.…”
Section: Resultsmentioning
confidence: 90%
“…The transparent conductor electrode (thickness ~ 340 nm), indium thin oxide-ITO (SCI Engineered Materials Inc.) was deposited on flat and nano-patterned glass substrates by Pulsed Laser Deposition (PLD) technique using an excimer laser source with krypton fluoride (Coherent, ComplexPro 205, λ = 248 nm, FWHM = 25 ns) involving the following parameters: 1.2 J/cm 2 for the laser fluence, 1.5 × 10 −2 mbar for the oxygen pressure, 7000 for the number of laser pulses and 5 cm for the distance between the target and the substrate. More details regarding the ITO deposition and properties of the obtained TCE layer are given in our previous work 25 .…”
Section: Methodsmentioning
confidence: 99%
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