Pulsed laser deposition of HfO2 thin films on indium zinc oxide: Band offsets measurements

The Effect of Nb Incorporation on the Electronic Properties of Anodic HfO2

“…Nowadays HfO 2 is usually prepared by techniques such as atomic layer deposition, 16 sputtering, 5 pulsed laser deposition, 17 chemical vapor deposition, 18 high energy ion beam assisted deposition 19 and sol-gel methods. 20 An alternative technique to the classical methods of electronic industry to fabricate oxides-based devices is the anodizing, a simple and low cost process that allows to strictly and easily tailor oxides structure, thickness, composition and morphology by controlling the metal or alloy composition as well as the oxidation conditions.…”