Pulsed laser deposition of bismuth in the presence of different ambient atmospheres

Producción y caracterización de recubrimientos de bismuto producidos con magnetrón desbalanceado pulsado

“…Las imágenes de la topografía de las películas de bismuto logradas mediante AFM se muestran en la Figura 2, donde se observa que hay un efecto de las frecuencias sobre la su-distribución de granos más homogénea, mientras que en las otras dos películas exhiben partículas con diferentes tamaños de grano y en todos los casos más grandes que los hallados en la película crecida a 40 kHz. Esta distribución de partícu-las genera la alta rugosidad de las películas de bismuto las cuales son de 25.1 nm, 20.0nm y 28.9 nm en las muestras a 0 40 y 80 khz, respectivamente, estos mismos resultados han sido reportados por otros autores [9,14,20]. [21][22].…”

Microstructure, morphology, adhesion and tribological behavior of sputtered niobium carbide and bismuth films on tool steel

“…Among the materials that might be used as a solid coating with tribological purposes is bismuth (Bi), a highly anisotropic semimetal of the group V with low melting point (544 K) and thermal conductivity with an order of magnitude less than typical metals (Boffoue et al, 1998). Bi crystallizes in a rhombohedral structure and forms layers between which there are weak bonds compared with the internal bonds of the layer itself.…”

“…Under mechanical load the Bi melts and provides instantaneous protection by preventing direct contact between the sliding surfaces (Zhao et al, 2004). Films of Bi have been produced by sputtering (Kim et al, 2006), by pulsed laser deposition (Boffoue et al, 1998) and by thermal evaporation (Kumari et al, 2007).…”

Hybrid magnetometers for unshielded operation : combining hall sensors with superconducting flux concentrators

“…Since the 1960s investigations concerning Bi film growth were motivated by both ordinary and quantum size effect studies. In literature reports have been made on the deposition of Bi by various techniques like PLD [107][108][109], DC-sputtering [109], RF-magnetron sputtering [110], thermal evaporation [46], electro deposition [111] and molecular beam epitaxy (MBE) [112,113].…”

“…The deposition was carried out for 5 temperature values between 373 and 413 K. The choice for this temperature range is based on the results from literature [107,110,112,113]. Two values, 100 and 200 W, for the sputtering power were used.…”