Pulsed Corona Experiments

Heesch, van Ejm Bert; Pemen, Ajm Guus; Snoek, van der Jw; Laan, van der Pct Piet

doi:10.1007/978-1-4615-3706-9_48

Cited by 4 publications

(3 citation statements)

References 1 publication

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“…Once identified patterns have been confirmed, the (12) patterns should be registered in a patterns repository for later use by others. A few researchers have proposed such repositories for patterns [20] or architectures in general [21]. Over time, the patterns repository will be populated with information of many systems, which we envisage to be a valuable tool for others in understanding the architecture of OSS products.…”

Section: Fig 2 Idapo: a Process For Identifying Architecture Pattermentioning

confidence: 99%

Design and Evaluation of a Process for Identifying Architecture Patterns in Open Source Software

Stol

Avgeriou

Babar

2011

Software Architecture

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Abstract. Architecture patterns have a direct effect (positive or negative) on a system's quality attributes (e.g., performance). Therefore, information about patterns used in a product can provide valuable insights to, e.g., component integrators who wish to evaluate a software product. Unfortunately, this information is often not readily available, in particular for Open Source Software (OSS) products, which are increasingly used in component-based development. This paper presents the design and evaluation of a process for Identifying Architecture Patterns in OSS ("IDAPO"). The results of the evaluation suggest that IDAPO is helpful to identify potentially present patterns, and that a process framework may provide better opportunities for tailoring to the users' needs.

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Section: Fig 2 Idapo: a Process For Identifying Architecture Pattermentioning

confidence: 99%

Design and Evaluation of a Process for Identifying Architecture Patterns in Open Source Software

Stol

Avgeriou

Babar

2011

Software Architecture

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“…Government policies can adapt to new technologies in three aspects of pollution: source, measurement, control. A control technology that has been emerging since the 1980s is cold plasma driven pollution abatement ( Goldman et al, 1985 ; Mizuno et al, 1986 ; Masuda and Nakao, 1986 ; 1988 ; van Heesch, et al, 1989 ; 2008 ; 2012 ; Chang et al, 1991 ; Rosocha et al, 1993 ; 2000 ; Yan et al, 2001 ; Winands et al, 2006 ; Hoeben et al, 2012 ; Beckers et al, 2013 ; Huiskamp et al, 2014 ; 2017 ; 2019 ; 2020 ). The plasma is a pulsed electric gas discharge.…”

Section: Introductionmentioning

confidence: 99%

“…Cold pulsed plasmas for chemical processing were reported already in the 1980s, e.g., in ( Goldman et al, 1985 ; Masuda et al, 1986 ; 1988 ; Mizuno et al, 1986 ). High pulsed currents in streamer-plasma reactors were first documented in 1989 ( van Heesch et al, 1989 ).…”

Section: Introductionmentioning

confidence: 99%

Pulsed processing by cold plasma, applied to industrial emission control

Van Heesch,

Huiskamp,

Yan

et al. 2024

Front. Chem.

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A promising pollution control technology is cold plasma driven chemical processing. The plasma is a pulsed electric gas discharge inside a near atmospheric-pressure-temperature reactor. The system is energized by a continuous stream of very short high-voltage pulses. The exhaust gas to be treated flows through the reactor. The methods applied involve the development of robust cold plasma systems, industrial applications and measuring technologies. Tests of the systems were performed at many industrial sites and involved control of airborne VOC (volatile organic compound) and odor. Electrical, chemical and odor measuring data were collected with state-of-the-art methods. To explain the test data an approximate solution of global reaction kinetics of pulsed plasma chemistry was developed. It involves the Lambert function and, for convenience, a simple approximation of it. The latter shows that the amount of removal, in good approximation, is a function of a single variable. This variable is electric plasma power divided by gas flow divided by input concentration. In the results sections we show that in some cases up to 99% of volatile pollution can be removed at an acceptable energy requirement. In the final sections we look into future efficiency enhancements by implementation of (sub)nanosecond pulsed plasma and solid state high-voltage technology and by integration with catalyst technology.

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