Pulse Energy Effect on the Optical Properties of Pulse Laser Deposited SiO2 Thin Films

Abstract

In this work the effect of laser pulse energy on the optical properties of five samples of SiO2 thin film deposited using pulse laser deposition technique was studied. Pulse energies of 100,150,180, 200 and 250 mj with fixed pulse repetition rate and number of pulses of 2 Hz, and 10 pulses, were used. The target to substrate distance and angle were fixed. The film thickness was measured by FESEM, and the transmission spectrum at certain wavelengths for each film was recorded. SiO2 thin films transmission data and the measured film thicknesses were used to deduce their optical properties. The results showed that increasing the pulse energy results in an increase of the film thickness and the morphology of the films becomes more dense and non-smooth at higher pulse energy, also the optical properties showed to be affected by the thickness variation and hence by the pulse energy.

Pulsed Laser Deposition of Transparent Conductive Oxides on UV-NIL Patterned Substrates for Optoelectronic Applications

“…The pulse repetition rate influences the deposition rate, this being related to the duration necessary to get a specific thickness of the film [63]. The number of the particles, which are found as islands, grown firstly on the deposition substrate, subsequently tend to diffuse and aggregate depending on the pulse repetition rate, a higher density of islands being favored by the increase of this parameter.…”