2009
DOI: 10.1103/physrevlett.103.159902
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Publisher’s Note: How Perfect Can Graphene Be? [Phys. Rev. Lett.103, 136403 (2009)]

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Cited by 76 publications
(115 citation statements)
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“…[16,17] and the Supplemental Material [27]) permitted Raman scattering experiments in magnetic fields up to 14 T (supplied by a superconducting coil, data collected for G-BN) or up to 29=30 T (supplied by a resistive magnet, data collected for G-S and G-Gr), at low temperatures (4 K) and with a spatial resolution of ∼1 μm (diameter of the laser spot on the sample). Though the adequate electrical characterization of the investigated samples was not possible, we assume here that all our three graphene flakes are not far from being neutral systems; this is supported by many other studies of similar structures [23,24,28,29].…”
mentioning
confidence: 59%
“…[16,17] and the Supplemental Material [27]) permitted Raman scattering experiments in magnetic fields up to 14 T (supplied by a superconducting coil, data collected for G-BN) or up to 29=30 T (supplied by a resistive magnet, data collected for G-S and G-Gr), at low temperatures (4 K) and with a spatial resolution of ∼1 μm (diameter of the laser spot on the sample). Though the adequate electrical characterization of the investigated samples was not possible, we assume here that all our three graphene flakes are not far from being neutral systems; this is supported by many other studies of similar structures [23,24,28,29].…”
mentioning
confidence: 59%
“…They have been evidenced by low temperature STM experiments 24 , studied by an EPR-like technique in magnetic fields 25 and mapped with microRaman scattering measurements in high magnetic fields revealing their graphene-like electronic excitation spectrum 13 and the associated magneto-phonon effect 13,20 .…”
Section: Methodsmentioning
confidence: 99%
“…It is assumed that the MGL struc- ture under consideration comprises K upper GLs and a highly conducting bottom GL on a SiC substrate or K GLs (without the bottom GL) on a Si substrate. Epitaxial MGL structures with up to K = 100 GLs with very long momentum relaxation time of electrons and holes (τ ≃ 20 ps) were recently fabricated using the thermal decomposition from 4H-SiC substrate [15]. MGL structures without the bottom GL can be fabricated using chemical/mechanical reactions and transferred substrate techniques which include chemically etching the substrate and the highly conducting bottom GL [16] (or mechanically peeling the upper GLs) and transferring the upper portion of the MGL structure on a Si or equivalent transparent substrate.…”
Section: Device Modelmentioning
confidence: 99%