2019
DOI: 10.1364/oe.27.008639
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Ptychographic characterisation of polymer compound refractive lenses manufactured by additive technology

Abstract: The recent success in the development of high precision printing techniques allows one to manufacture free-standing polymer structures of high quality. Two-photon polymerization lithography is a mask-less technique with down to 100 nm resolution that provides full geometric freedom. It has recently been applied to the nanofabrication of X-ray compound refractive lenses (CRLs). In this article we report on the characterization of two sets of CRLs of different design produced by two-photon polymerization induced… Show more

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Cited by 26 publications
(11 citation statements)
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“…A polymer-based corrector plate is used in the present study and its thickness required for compensation wavefront error is calculated using equation (7). A typical 3D printable polymer IP-S of thickness difference Át = 10 mm will produce a phase advance 2Át/ and will introduce an optical path difference of 11.74 pm [molecular formula C 14 H 18 O 7 , density = 1.2 g cm À3 (Lyubomirskiy, Koch et al, 2019)]. An estimated thickness profile of the IP-S corrector in a 3D symmetry is shown in Fig.…”
Section: Corrector Plate Designmentioning
confidence: 99%
“…A polymer-based corrector plate is used in the present study and its thickness required for compensation wavefront error is calculated using equation (7). A typical 3D printable polymer IP-S of thickness difference Át = 10 mm will produce a phase advance 2Át/ and will introduce an optical path difference of 11.74 pm [molecular formula C 14 H 18 O 7 , density = 1.2 g cm À3 (Lyubomirskiy, Koch et al, 2019)]. An estimated thickness profile of the IP-S corrector in a 3D symmetry is shown in Fig.…”
Section: Corrector Plate Designmentioning
confidence: 99%
“…The core part of PtyNAMi is designed to accommodate different nanofocusing X-ray optics, such as NFLs (Schroer et al, 2003(Schroer et al, , 2004 for the harder X-ray regime above E = 10 keV and FZPs (Vila-Comamala et al, 2011;Gorelick et al, 2011;Parfeniukas et al, 2016;Mohacsi et al, 2016) for the lower X-ray spectrum below E = 10 keV. The setup is quite flexible, providing a general platform for the characterization of new X-ray optics (Seiboth et al, 2014;Lyubomirskiy et al, 2019). In particular, adiabatically focusing lenses (AFLs) Patommel et al, 2017) or multilayer Laue lenses (Kang et al, 2008;Bajt et al, 2018) can reach the sub-20 nm resolution regime on a routine basis.…”
Section: X-ray Optics and Nanobeam Characterizationmentioning
confidence: 99%
“…Technical advances have enabled the microfabrication of diamond lenses by ion/plasma etching (Alianelli et al, 2010;Lyubomirskiy et al, 2019a), laser ablation (Terentyev et al, 2017;Antipov et al, 2018), or focused ion beam milling (Medvedskaya et al, 2020). Another new approach is the additive manufacturing of lenses by two-photon polymerization (Petrov et al, 2017;Lyubomirskiy et al, 2019b). So far, all techniques struggle with inherent limitations of the fabrication process and the production of X-ray optics with diffractionlimited performance, high numerical aperture (NA), large geometrical aperture, and sufficient radiation resistance is non-trivial.…”
Section: Introductionmentioning
confidence: 99%