2002
DOI: 10.1103/physrevb.66.045402
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Pseudomorphic to orthomorphic growth of Fe films onCu3Au(001)

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Cited by 12 publications
(21 citation statements)
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“…Since the electron mean free path in Fe deduced from the attenuation of the substrate Cu 60 eV Auger line is much smaller ͑Ͻ5 Å͒, we conclude that and ␥ phases coexist in the film for coverages above 5.5 Å, in agreement with Ref. 5.…”
Section: A Structuresupporting
confidence: 91%
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“…Since the electron mean free path in Fe deduced from the attenuation of the substrate Cu 60 eV Auger line is much smaller ͑Ͻ5 Å͒, we conclude that and ␥ phases coexist in the film for coverages above 5.5 Å, in agreement with Ref. 5.…”
Section: A Structuresupporting
confidence: 91%
“…We stress that all the films have been systematically deposited with the substrate held at 300 K. This has been done in order to be consistent with the experimental procedure of Ref. 5. In fact, it has been observed that a different substrate temperature during the growth leads to a different thickness dependence of the structure 8 and of the magnetism 2 of the films.…”
Section: Methodsmentioning
confidence: 85%
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