Proximity Effect Correction By Pattern Modified Stencil Mask In Large Field Projection Electron-Beam Lithography

Kobinata, H.; Yamashita, Hiroshi; Nomura, Eiichi; Nozue, Hiroshi

doi:10.1109/imnc.1998.730009

Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No 1998

DOI: 10.1109/imnc.1998.730009

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Proximity Effect Correction By Pattern Modified Stencil Mask In Large Field Projection Electron-Beam Lithography

H. Kobinata¹,

Hiroshi Yamashita²,

Eiichi Nomura³

et al.

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Proximity Effect Correction By Pattern Modified Stencil Mask In Large Field Projection Electron-Beam Lithography

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References 3 publications

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