2006
DOI: 10.1109/tns.2006.874620
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Proton damage effects in high performance P-channel CCDs

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Cited by 4 publications
(1 citation statement)
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“…The LBNL p-channel CCDs are fabricated on high-resistivity n-type silicon with boron implanted channels. In the p-channel CCDs, divacancy states are expected to be the dominant hole trap [7]- [9]. It has been predicted that divacancy formation in p-channel CCDs is less favorable than phosphorus-vacancy traps in n-channel CCDs [8], and prior studies have shown improved performance after radiation exposure [7], [10], [11].…”
Section: Ccd Requirementsmentioning
confidence: 99%
“…The LBNL p-channel CCDs are fabricated on high-resistivity n-type silicon with boron implanted channels. In the p-channel CCDs, divacancy states are expected to be the dominant hole trap [7]- [9]. It has been predicted that divacancy formation in p-channel CCDs is less favorable than phosphorus-vacancy traps in n-channel CCDs [8], and prior studies have shown improved performance after radiation exposure [7], [10], [11].…”
Section: Ccd Requirementsmentioning
confidence: 99%