2022
DOI: 10.1016/j.xpro.2021.101015
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Protocol on the fabrication of monocrystalline thin semiconductor via crack-assisted layer exfoliation technique for photoelectrochemical water-splitting

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Cited by 2 publications
(2 citation statements)
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“…This prevents the wafer from moving and floating on the chemical solution. [138] The screen-printing process for forming metal electrodes presents significant challenges due to the high-temperature firing process (> 900 °C) and mechanical pressure required for intimate contact with the thin c-Si wafer. [139] This process generates mechanical stress due to the coefficient of thermal expansion difference between c-Si and the printed metal, resulting in severe wafer bowing.…”
Section: Thin C-si Wafer Handling As Free-standing Filmmentioning
confidence: 99%
“…This prevents the wafer from moving and floating on the chemical solution. [138] The screen-printing process for forming metal electrodes presents significant challenges due to the high-temperature firing process (> 900 °C) and mechanical pressure required for intimate contact with the thin c-Si wafer. [139] This process generates mechanical stress due to the coefficient of thermal expansion difference between c-Si and the printed metal, resulting in severe wafer bowing.…”
Section: Thin C-si Wafer Handling As Free-standing Filmmentioning
confidence: 99%
“…Achievements and needs of modern technologies determine the leading topical direction of development of research in metal physics and semiconductor physics as the study of the properties of low-dimensional structures (nanostructures) and the development of scientifically sound means of their synthesis [1,2]. Modern experimental methods provide the possibility of creating porous structures single-crystal layers [3,4] and multilayer heterostructures [5,6]. The thickness of the layers in such structures, or the characteristic pore size, is from one to ten nanometres, which corresponds to the de Broglie wavelength of the charge carriers [7,8].…”
Section: Introductionmentioning
confidence: 99%