Protein-releasing conductive anodized alumina membranes for nerve-interface materials

Altuntaş, Sevde; Büyükserin, Fatih; Haider, Ali; Altınok, Buket; Bıyıklı, Necmi; Aslım, Belma

doi:10.1016/j.msec.2016.05.084

Cited by 11 publications

(17 citation statements)

References 45 publications

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“…Topographical features are important to neural interfacing in terms of local cells, since mechanotransductive components in cells are able to perceive topographical features in the microenvironment. As a result, cells are able to convert mechanical stimuli information to corresponding physiological signals ( Altuntas et al, 2016 ; Schulte et al, 2016a , b ; Shi et al, 2016 ; Bonisoli et al, 2017 ; Maffioli et al, 2017 ). Those physiological signals are capable of eliciting further cellular responses and affecting cell function ( Bonisoli et al, 2017 ).…”

Section: Proposed Mechanism Of Cellular Response To Nano-architecturementioning

confidence: 99%

Nano-Architectural Approaches for Improved Intracortical Interface Technologies

et al. 2018

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Intracortical microelectrodes (IME) are neural devices that initially were designed to function as neuroscience tools to enable researchers to understand the nervous system. Over the years, technology that aids interfacing with the nervous system has allowed the ability to treat patients with a wide range of neurological injuries and diseases. Despite the substantial success that has been demonstrated using IME in neural interface applications, these implants eventually fail due to loss of quality recording signals. Recent strategies to improve interfacing with the nervous system have been inspired by methods that mimic the native tissue. This review focusses on one strategy in particular, nano-architecture, a term we introduce that encompasses the approach of roughening the surface of the implant. Various nano-architecture approaches have been hypothesized to improve the biocompatibility of IMEs, enhance the recording quality, and increase the longevity of the implant. This review will begin by introducing IME technology and discuss the challenges facing the clinical deployment of IME technology. The biological inspiration of nano-architecture approaches will be explained as well as leading fabrication methods used to create nano-architecture and their limitations. A review of the effects of nano-architecture surfaces on neural cells will be examined, depicting the various cellular responses to these modified surfaces in both in vitro and pre-clinical models. The proposed mechanism elucidating the ability of nano-architectures to influence cellular phenotype will be considered. Finally, the frontiers of next generation nano-architecture IMEs will be identified, with perspective given on the future impact of this interfacing approach.

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Section: Proposed Mechanism Of Cellular Response To Nano-architecturementioning

confidence: 99%

Nano-Architectural Approaches for Improved Intracortical Interface Technologies

et al. 2018

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“…The fabricated uniform array of ZnO nanostructures possessed sub-100 nm feature and spatial resolutions, exhibiting narrow distributions in size and separation, and superior mechanical stability. AAO template has been commonly used for ZnO nanorod fabrication; AAO features long-range ordered vertically aligned nanopores with varying aspect ratios whose dimensions can be easily controlled by adjusting the process conditions [308,310,312,313]. It is a fairly simple technique to obtain ZnO nanorods by growing on these templates followed by the removal process of AAO, usually accomplished by chemical wet etching.…”

Section: D Structuresmentioning

confidence: 99%

Atomic layer deposition: an enabling technology for the growth of functional nanoscale semiconductors

Bıyıklı

Haider

2017

Semicond. Sci. Technol.

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In this paper, we present the progress in the growth of nanoscale semiconductors grown via atomic layer deposition (ALD). After the adoption by semiconductor chip industry, ALD became a widespread tool to grow functional films and conformal ultra-thin coatings for various applications. Based on self-limiting and ligand-exchange-based surface reactions, ALD enabled the low-temperature growth of nanoscale dielectric, metal, and semiconductor materials. Being able to deposit wafer-scale uniform semiconductor films at relatively low-temperatures, with sub-monolayer thickness control and ultimate conformality, makes ALD attractive for semiconductor device applications. Towards this end, precursors and low-temperature growth recipes are developed to deposit crystalline thin films for compound and elemental semiconductors. Conventional thermal ALD as well as plasma-assisted and radical-enhanced techniques have been exploited to achieve device-compatible film quality. Metal-oxides, III-nitrides, sulfides, and selenides are among the most popular semiconductor material families studied via ALD technology. Besides thin films, ALD can grow nanostructured semiconductors as well using either template-assisted growth methods or bottom-up controlled nucleation mechanisms. Among the demonstrated semiconductor nanostructures are nanoparticles, nano/ quantum-dots, nanowires, nanotubes, nanofibers, nanopillars, hollow and core-shell versions of the afore-mentioned nanostructures, and 2D materials including transition metal dichalcogenides and graphene. ALD-grown nanoscale semiconductor materials find applications in a vast amount of applications including functional coatings, catalysis and photocatalysis, renewable energy conversion and storage, chemical sensing, opto-electronics, and flexible electronics. In this review, we give an overview of the current state-of-the-art in ALD-based nanoscale semiconductor research including the already demonstrated and future applications.

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“…As fabrication has moved from the micro into the nanoscale, special interest has been given to spontaneous fabrication methods that yield nanostructured materials; naturally, anodization has come into play. In addition to commonly used Al, other anodized materials include Ti ; Ta ; Zr ; Nb ; GaN ; and have been studied for applications such as drug release , electrically active membranes , solar cells , and protein‐releasing conductive membranes , among many others.…”

Section: Anodizationmentioning

confidence: 99%

Fabrication techniques enabling ultrathin nanostructured membranes for separations

Mireles

Gaborski

2017

Electrophoresis

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The fabrication of nanostructured materials is an area of continuous improvement and innovative techniques that fulfill the demand of many fields of research and development. The continuously decreasing size of the smallest patternable feature has expanded the catalog of methods enabling the fabrication of nanostructured materials. Several of these nanofabrication techniques have sprouted from applications requiring nanoporous membranes such as molecular separations, cell culture, and plasmonics. This review summarizes methods that successfully produce through-pores in ultrathin films exhibiting an approximate pore size to thickness ratio of one, which has been shown to be beneficial due to high permeability and improved separation potential. The material reviewed includes large-area, parallel, and affordable approaches such as self-organizing polymers, nanosphere lithography, anodization, nanoimprint lithography as well as others such as solid phase crystallization and nanosphere lens lithography. The aim of this review is to provide a set of inexpensive fabrication techniques to produce nanostructured materials exhibiting pores ranging from 10 to 350 nm and exhibiting a pore size to thickness ratio close to one. The fabrication methods described in this work have reported the successful manufacture of nanoporous membranes exhibiting the ideal characteristics to improve selectivity and permeability when applied as separation media in ultrafiltration.

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Protein-releasing conductive anodized alumina membranes for nerve-interface materials

Cited by 11 publications

References 45 publications

Nano-Architectural Approaches for Improved Intracortical Interface Technologies

Nano-Architectural Approaches for Improved Intracortical Interface Technologies

Atomic layer deposition: an enabling technology for the growth of functional nanoscale semiconductors

Fabrication techniques enabling ultrathin nanostructured membranes for separations

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