Protective Properties of Dodecanethiol Layers on Copper Surfaces:  The Effect of Chloride Anions in Aqueous Environments

Azzaroni, Omar; Cipollone, Mariano; Vela, M. E.; Salvarezza, Roberto Carlos

doi:10.1021/la000852c

Cited by 57 publications

(40 citation statements)

References 31 publications

(56 reference statements)

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“…In the case of dodecanethiolate-SAMs we have estimated the uncovered area (the contact area) in 0.01 % from electrochemical measurements. [31] This fact implies that in presence of the SAM, the effective cohesion energy corresponding to the electrode-SAM-electrodeposit is 100 times smaller than that corresponding to the electrode-electrodeposit system.…”

Section: Electrochemical Stability Of Samsmentioning

confidence: 99%

Electrochemical Deposition onto Self‐Assembled Monolayers: New Insights into Micro‐ and Nanofabrication

Schilardi

Dip

Claro

et al. 2005

Chemistry A European J

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Pattern transfer with high resolution is a frontier topic in the emerging field of nanotechnologies. Electrochemical molding is a possible route for nanopatterning metal, alloys and oxide surfaces with high resolution in a simple and inexpensive way. This method involves electrodeposition onto a conducting master covered by a self-assembled alkanethiolate monolayer (SAMs). This molecular film enables direct surface-relief pattern transfer from the conducting master to the inner face of the electrodeposit, and also allows an easy release of the electrodeposited film due their excellent anti-adherent properties. Replicas of the original conductive master can be also obtained by a simple two-step procedure. SAM quality and stability under electrodeposition conditions combined with the formation of smooth electrodeposits are crucial to obtain high-quality pattern transfer with sub-50 nm resolution.

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Section: Electrochemical Stability Of Samsmentioning

confidence: 99%

Electrochemical Deposition onto Self‐Assembled Monolayers: New Insights into Micro‐ and Nanofabrication

Schilardi

Dip

Claro

et al. 2005

Chemistry A European J

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“…Other important applications of SAMs include use in the fabrication of corrosion resistive coatings, [17][18][19] as active or passive elements in electronic devices, [20][21][22] and as inks in dip pen lithography. [23][24][25][26] Additionally, SAMs can serve as models to study the properties of membranes in cell organelles, and can be used as building blocks for biomimetic systems.…”

Section: Introductionmentioning

confidence: 99%

Modification of Electrode Surfaces by Self‐Assembled Monolayers of Thiol‐Terminated Oligo(Phenyleneethynylene)s

et al. 2013

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The wire‐like properties of four S‐(4‐{2‐[4‐(2‐phenylethynyl)phenyl]ethynyl}phenyl) thioacetate derivatives, PhC≡CC6H4C≡CC6H4SAc (1), H2NC6H4C≡CC6H4C≡CC6H4SAc (2), PhC≡CC6H2(OMe)2C≡CC6H4SAc (3) and AcSC6H4C≡CC6H4C≡CC6H4SAc (4) (Figure 1), all of which possess a high degree of conjugation along the oligo(phenyleneethynylene) (OPE) backbone, were investigated as self‐assembled monolayers (SAMs) on gold and platinum electrodes by cyclic voltammetry (CV) and electrochemical impedance spectroscopy (EIS). The redox probe [Fe(CN)6]4− was used in both the CV and impedance experiments. The results indicate that the thiolates derived from thioacetate‐protected precursor molecules 1 and 2 form well‐ordered monolayers on a gold electrode, whereas SAMs derived from 3 and 4 exhibit randomly distributed pinholes. The electron tunnelling resistance and fractional coverage of SAMs of all four compounds were examined using electron tunnelling theory. The analysis of the results reveal that the well‐ordered SAMs of 1 and 2 exhibit higher charge‐transfer resistance in comparison to the defect‐ridden SAMs of 3 and 4. The additional steric bulk offered by the methoxy groups in 3 is likely to prevent efficient packing within the SAM, leading to a microelectrode behaviour, when assembled on a gold electrode surface. The protected dithiol derivative 4 probably binds to the surface through both terminal groups which prevents dense packing and leads to the formation of a monolayer with randomly distributed pinholes. Atomic force microscopy (AFM) was used to examine the morphology of the monolayers, and height images gave root‐mean‐square (RMS) roughness′s which are in agreement with the proposed SAM structures.

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“…1 -4 The metal surfaces modified with adlayers formed from these organosulphur compounds have attracted considerable attention over the past years because of very large technological applications of such systems. The following representative applications of metals modified with organic adlayers may serve to illustrate their wide technological importance: construction of chemical 5,6 and biochemical 7,8 sensors; providing microenvironments on metal surfaces similar to biological membranes that allows adsorption of proteins without denaturization, 7,9 immobilization of DNA 10,11 or adhesion of living cells to the metal surface; 7,12 preparation of surfaces that resist the adsorption of proteins and cell attachment; 12,13 preparation of surfaces for controlled growth of crystals; 14 micro contact printing of metals; 15,16 protection of metals against corrosion; 17,18 antiadherent coatings of metal surfaces. 19 To prepare the metal substrates (as electrodes) for some applications, the surface of the metal is modified with the organic adlayer formed from substituted alkanethiols (typically ω-substituted: HS-(CH 2 n -X).…”

Section: Introductionmentioning

confidence: 99%

Raman study on the structure of adlayers formed on silver from mixtures of 2-aminoethanethiol and 3-mercaptopropionic acid

Wrzosek

Bukowska

Kudelski

2005

J. Raman Spectrosc.

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Silver surfaces were covered with adlayers formed from mixtures of 2-aminoethanethiol (cysteamine, CYS) and 3-mercaptopropionic acid (MPA). The composition and structure of adlayers thus formed were investigated by surface-enhanced Raman scattering (SERS). SERS measurements revealed that the layer formed from the 1 : 1 mixture of 10-mM aqueous solutions of CYS and MPA is composed of co-adsorbed CYS and MPA molecules. From the SERS spectrum of such an adlayer, one can also deduce that practically all MPA molecules are dissociated. pH-controlled experiments showed that MPA is also dissociated when mixed MPA + CYS adlayer is soaked in the solution buffered to pH = 5.0, whereas in the case of one-component adlayer, almost all MPA molecules are protonated at the same pH value. It means that the presence of CYS molecules induces dissociation of neighbouring MPA molecules and that co-adsorbed MPA and CYS probably form mixed salt-like structures under these conditions. At lower pH values (3.2), the layer is mainly composed of non-dissociated MPA molecules, while at slightly alkaline solution (pH = 9) strong preference of CYS molecules at the surface adlayer is observed. This phenomenon may be ascribed to strong stabilization of the adlayer structure by the network of hydrogen bonds between COOH (at lower pH) or NH 2 (at higher pH) groups of adjacent molecules. Formation of mixed adlayer is possible in the limited range of pH values that enable protonation of NH 2 groups with simultaneous deprotonation of the COOH groups. Our results also demonstrate that the mixed salt-like MPA + CYS adlayers could be formed from the MPA + CYS solutions only if the concentrations of both compounds are of the same order of magnitude. This suggests no strong thermodynamic preference for such adlayers.

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Protective Properties of Dodecanethiol Layers on Copper Surfaces: The Effect of Chloride Anions in Aqueous Environments

Cited by 57 publications

References 31 publications

Electrochemical Deposition onto Self‐Assembled Monolayers: New Insights into Micro‐ and Nanofabrication

Electrochemical Deposition onto Self‐Assembled Monolayers: New Insights into Micro‐ and Nanofabrication

Modification of Electrode Surfaces by Self‐Assembled Monolayers of Thiol‐Terminated Oligo(Phenyleneethynylene)s

Raman study on the structure of adlayers formed on silver from mixtures of 2-aminoethanethiol and 3-mercaptopropionic acid

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