Protection of polymer from atomic-oxygen erosion using Al2O3 atomic layer deposition coatings

Cooper, Russell; Upadhyaya, Hari P.; Minton, Timothy K.; Berman, Michael R.; Du, X.H.; George, Steven M.

doi:10.1016/j.tsf.2007.07.150

Cited by 136 publications

(85 citation statements)

References 26 publications

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“…[1][2][3][4][5][6][7][8][9][10] Recently, many research groups have extensively investigated the various properties of metal oxide nanostructures with different dimensions (D) and they observed that only few of these metal oxide possess either d 0 (TiO 2 , WO 3 electronic configuration of cations exhibit feasible gas sensing properties. 11 Although there exist a few metal oxides with a d n (0 < n < 10) configuration of cations (NiO, VO 2 , Cr 2 O 3 , RuO 2 etc.)…”

Section: Introductionmentioning

confidence: 99%

Probing the highly efficient room temperature ammonia gas sensing properties of a luminescent ZnO nanowire array prepared via an AAO-assisted template route

et al. 2014

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Here, we report the facile synthesis of a highly ordered luminescent ZnO nanowire array using a low temperature anodic aluminium oxide (AAO) template route which can be economically produced in large scale quantity. The as-synthesized nanowires have diameters ranging from 60 to 70 nm and length ∼11 µm. The photoluminescence spectrum reveals that the AAO/ZnO assembly has a strong green emission peak at 490 nm upon excitation at a wavelength of 406 nm. Furthermore, the ZnO nanowire array-based gas sensor has been fabricated by a simple micromechanical technique and its NH 3 gas sensing properties have been explored thoroughly. The fabricated gas sensor exhibits excellent sensitivity and fast response to NH 3 gas at room temperature. Moreover, for 50 ppm NH 3 concentration, the observed value of sensitivity is around 68%, while the response and recovery times are 28 and 29 seconds, respectively. The present synthesis technique to produce a highly ordered ZnO nanowire array and a fabricated gas sensor has great potential to push the low cost gas sensing nanotechnology.

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Section: Introductionmentioning

confidence: 99%

Probing the highly efficient room temperature ammonia gas sensing properties of a luminescent ZnO nanowire array prepared via an AAO-assisted template route

et al. 2014

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“…Al 2 O 3 ALD is a particularly robust and welldefined ALD system [14], and can be considered a rather typical and "ideal" ALD process [26]. Al 2 O 3 ALD films can be pinhole-free as demonstrated by electrical instruments and can be deposited on polymer substrates [14].…”

Section: Growth Theorymentioning

confidence: 99%

“…Al 2 O 3 ALD films can be pinhole-free as demonstrated by electrical instruments and can be deposited on polymer substrates [14]. One basic condition for a successful ALD process is that the binding energy of a monolayer chemisorbed on a surface is higher than the binding energy of subsequent layers on top of the formed layer, that it can be controlled by the reaction temperature.…”

Section: Growth Theorymentioning

confidence: 99%

“…This technique is a thin film growth technique that relies on two sequential, self-limiting surface reactions between gas phase precursor molecules and a solid surface as illustrated in Fig. 1 [14][15][16][17]. The films formed by sequential pulsing of two or more reactants, using purging with inert gas between the precursor pulses to avoid gas-phase reactions [17].…”

Section: Introductionmentioning

confidence: 99%

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A Review of Atomic Layer Deposition for Nanoscale Devices

Riyanto

Rijanto

Prawara

2012

J. Mechatron. Electr. Power Veh. Technol.

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Atomic layer deposition (ALD) is a thin film growth technique that utilizes alternating, self-saturation chemical reactions between gaseous precursors to achieve a deposited nanoscale layers. It has recently become a subject of great interest for ultrathin film deposition in many various applications such as microelectronics, photovoltaic, dynamic random access memory (DRAM), and microelectromechanic system (MEMS). By using ALD, the conformability and extreme uniformity of layers can be achieved in low temperature process. It facilitates to be deposited onto the surface in many variety substrates that have low melting temperature. Eventually it has advantages on the contribution to the wider nanodevices.Key words: thin coating, atomic layer deposition, nanoscale devices. Abstrak Atomic layer deposition (ALD) adalah teknik penumbuhan lapisan tipis yang menggunakan reaksi kimia jenuh antara gas pendahulu untuk mendapatkan deposisi lapisan skala nano. Teknik ini menjadi subyek yang sangat menarik saat ini untuk deposisi lapisan sangat tipis pada berbagai aplikasi seperti mikroelektronik, photovoltaic, dynamic random access memory (DRAM) dan sistem mikroelektromekanik (MEMS

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“…SiO 2 , Al 2 O 3 , indium tin oxide (ITO) and diamond-like carbon (DLC) coatings, the ion implantation method have been studied to protect the surface of polymer and PMC [10][11][12][13][14][15][16]. These coating methods are effective in improving the resistance against the LEO environment at the initial stages.…”

Section: Introductionmentioning

confidence: 99%

Inter-lamina Shear Strength of MWNT-reinforced Thin-Ply CFRP under LEO Space Environment

Moon¹,

Kim²

2017

Composites Research

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ABSTRACT:In this paper, the inter-lamina shear strength (ILSS) of multi-wall carbon nanotube (MWNT) reinforced carbon fiber reinforced plastics (CFRP) and thin-ply composites were verified under low earth orbit (LEO) space environment. CFRP, MWNT reinforced CFRP, thin-ply CFRP and MWNT reinforced thin-ply CFRP were tested after aging by using accelerated ground simulation equipment. The used ground simulation equipment can simulate high vacuum (2.5 × 10 -6 torr), atomic oxygen (AO, 9.15 × 10 14 atoms/cm 2 ·s), ultraviolet light (UV, 200 nm wave length) and thermal cycling (-70~100°C) simultaneously. The duration of aging experiment was twenty hours, which is an equivalent duration to that of STS-4 space shuttle condition. After the aging experiment, ILSS were measured at room temperature (27°C), high temperature (100°C) and low temperature (-100°C) to verify the effect of operation temperature. The MWNT and thin-ply shows good improvement of ILSS at ground condition especially with the thinply. And after LEO exposure large degradation of ILSS was observed at MWNT added composite due to the thermal cycle. And the degradation rate was much higher under the high temperature condition. But, at the low temperature condition, the ILSS was largely recovered due to the matrix toughening effect.

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Protection of polymer from atomic-oxygen erosion using Al2O3 atomic layer deposition coatings

Cited by 136 publications

References 26 publications

Probing the highly efficient room temperature ammonia gas sensing properties of a luminescent ZnO nanowire array prepared via an AAO-assisted template route

Probing the highly efficient room temperature ammonia gas sensing properties of a luminescent ZnO nanowire array prepared via an AAO-assisted template route

A Review of Atomic Layer Deposition for Nanoscale Devices

Inter-lamina Shear Strength of MWNT-reinforced Thin-Ply CFRP under LEO Space Environment

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