Protection of Metallic Copper from the Attack of Sulphuric Acid Using HDMMA, a Schiff Base Derived from l-Cysteine and 2-Hydroxy-1-naphthaldehyde

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Protection of Metallic Copper from the Attack of Sulphuric Acid Using HDMMA, a Schiff Base Derived from l-Cysteine and 2-Hydroxy-1-naphthaldehyde

Cited by 8 publications

References 34 publications

Silicate Dip-Coat Mechanism as an Inhibitor Against Copper Dissolution into Alkaline Chloride Media

Silicate Dip-Coat Mechanism as an Inhibitor Against Copper Dissolution into Alkaline Chloride Media

Experimental Modeling of Inhibition's Mechanism of Cupronickel Alloy by DETA and EDA into Acid Corrosive Media

Fabrication of metal-organic based complex film based on three-valent samarium ions-[bis (phosphonomethyl) amino] methylphosphonic acid (ATMP) for effective corrosion inhibition of mild steel in simulated seawater

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