1998
DOI: 10.1039/a803688h
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Protecting groups

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Cited by 35 publications
(20 citation statements)
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“…The DMTr protecting group was incorporated and the conversion of the secondary alcohol 10 to phosphoramidite 11 was performed. The base-labile cyanoethyl group [5152] is known to be resistant under synthesis conditions for the preparation of the phosphoramidite building block and for solid-phase oligonucleotide synthesis [49,53]. …”
Section: Resultsmentioning
confidence: 99%
“…The DMTr protecting group was incorporated and the conversion of the secondary alcohol 10 to phosphoramidite 11 was performed. The base-labile cyanoethyl group [5152] is known to be resistant under synthesis conditions for the preparation of the phosphoramidite building block and for solid-phase oligonucleotide synthesis [49,53]. …”
Section: Resultsmentioning
confidence: 99%
“…3 The success of benzyl ethers as protective synthetic intermediates of alcoholic groups mainly lies in their aptitude to release the benzyl moiety under the action of different reagents, which can be chosen depending on the sensitivity of the molecule to reaction conditions. 4 The presence of suitable functional groups on the phenyl ring of benzylic reagents can modulate their protecting/deprotecting features toward different OH groups and, therefore, enhance their applicability as orthogonal protecting groups for polyhydroxy compounds. 5 However, it would be highly desirable to obtain benzyl ethers (BnOR) from alcoholic substrates (ROH) by using the corresponding benzyl alcohols (BnOH), which are the most convenient sources of benzyl groups.…”
Section: Introductionmentioning
confidence: 99%
“…For the formation of silyl ethers of tert-alcohols with more bulky silyl PGs such as triethylsilyl (TES) [36] and tertbutyldimethylsilyl (TBS) [28] ethers, which are synthetically more useful than TMS ethers due to their improved stability towards acids and bases, [37][38][39] silyl triflate and silyl perchlorate reagents are generally relied upon [e.g. TBS-OTf (1.5 eq.…”
Section: Entrymentioning
confidence: 99%