Property Variation of Ni–W Electroformed Mold for Micro-Press Molding

Yasui, Manabu; Kaneko, Satoru; Takahashi, Masaharu; Ito, Hiroaki; Arai, Masahiro; Hirabayashi, Yasuo; Ozawa, Takeshi; Maeda, Ryutaro

doi:10.7567/jjap.52.11nj05

Cited by 7 publications

(6 citation statements)

References 25 publications

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“…The current density and temperature of the Ni-W bath were 1200 A=m 2 and 60 °C, respectively, with reference to the Ni-W mold for borosilicate glass. 22) The plating time was 5 min. We observed the surfaces of each obtained Ni-W film by field emission scanning electron microscopy (FE-SEM; FEI XL-30Sirion).…”

Section: Experimental Methodsmentioning

confidence: 99%

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Effect of metal ion concentration in Ni–W plating solution on surface roughness of Ni–W film

Yasui

Kaneko

Kurouchi

et al. 2015

Jpn. J. Appl. Phys.

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Since nanopatterns are used for various purposes including solar cells, super-hydrophilicity, and biosensors, it is necessary to miniaturize the patterns on glass devices from micro- to nano-order. We have studied glass imprinting as an excellent microfabrication technology for glass devices. Uniformity of the nanopattern height is required for a mold, since a nodular structure on the Ni–W surface is recognized as a problem in Ni–W nanopattern formation. We confirmed that the Ni–W plating bath increasing metal ion concentration is effective for inhibition of the nodular structure on the Ni–W film, and succeeded in Ni–W nano pattern formation with uniform height. However, the W content rate of plated Ni–W film was reduced in exchange for enhancing the flatness of the Ni–W film. It is necessary to examine the Ni–W plating condition for obtaining planarization of the Ni–W surface and a high content rate of W in the Ni–W film.

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Section: Experimental Methodsmentioning

confidence: 99%

“…21) Additionally, we showed the usability of Ni-W plating film as mold material of glass imprinting to satisfy the chemical stability, and heat resistance requirements. 22) However, an anomalous microspike called a nodule is easily formed on the Ni-W surface. Numerous studies have been reported concerning the nodule.…”

Section: Introductionmentioning

confidence: 99%

Effect of metal ion concentration in Ni–W plating solution on surface roughness of Ni–W film

Yasui

Kaneko

Kurouchi

et al. 2015

Jpn. J. Appl. Phys.

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“…In mold fabrication, a low thermal-expansion alloy is commonly used as a dummy substrate for the deposition of Ni–W during electroforming. For example, Yasui et al [ 60 ] reported a simple approach for Ni–W alloy mold fabrication using conventional lithography and electroforming. They used Incoloy909, a low coefficient of thermal expansion (CTE: 7.7 µm/m/°C) as a mold substrate.…”

Section: Mold Materials For Precision Glass Moldingmentioning

confidence: 99%

“…Some examples of glass molding experiments that have employed Ni and Ni alloy molds are summarized in Table S2 in the Supplementary Material of S2 [ 50 , 55 , 56 , 57 , 58 , 60 , 61 , 62 , 63 , 64 , 65 , 66 , 67 , 68 ]. Ni and Ni alloy molds have high mechanical hardness, high corrosion resistance, and lower thermal expansion coefficients.…”

Section: Mold Materials For Precision Glass Moldingmentioning

confidence: 99%

A Comprehensive Review of Micro/Nano Precision Glass Molding Molds and Their Fabrication Methods

et al. 2021

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Micro/nano-precision glass molding (MNPGM) is an efficient approach for manufacturing micro/nanostructured glass components with intricate geometry and a high-quality optical finish. In MNPGM, the mold, which directly imprints the desired pattern on the glass substrate, is a key component. To date, a wide variety of mold inserts have been utilized in MNPGM. The aim of this article is to review the latest advances in molds for MNPGM and their fabrication methods. Surface finishing is specifically addressed because molded glass is usually intended for optical applications in which the surface roughness should be lower than the wavelength of incident light to avoid scattering loss. The use of molds for a wide range of molding temperatures is also discussed in detail. Finally, a series of tables summarizing the mold fabrication methods, mold patterns and their dimensions, anti-adhesion coatings, molding conditions, molding methods, surface roughness values, glass substrates and their glass transition temperatures, and associated applications are presented. This review is intended as a roadmap for those interested in the glass molding field.

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“…4) We used SU-8 as the master mold for a Ni-W electroformed mold. 5) However, SU-8 microstructures are unsuitable for many applications requiring nanostructures, such as an optical fiber localized surface plasmon resonance (LSPR) biosensor, 6) and a subwavelength structure for solar cell application. 7) Ultraviolet (UV) exposure is not used for processing nanostructures because of the limit of the UV wavelength (350-400 nm).…”

mentioning

confidence: 99%

Effects of post exposure bake temperature and exposure time on SU-8 nanopattern obtained by electron beam lithography

Yasui

Kazawa

Kaneko

et al. 2014

Jpn. J. Appl. Phys.

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SU-8 is a photoresist imaged using UV rays. However, we investigated the characteristics of an SU-8 nanopattern obtained by electron beam lithography (EBL). In particular, we studied the relationship between post-exposure bake (PEB) temperature and exposure time on an SU-8 nanopattern with a focus on phase transition temperature. SU-8 residue was formed by increasing both PEB temperature and exposure time. To prevent the formation of this, Monte Carlo simulation was performed; the results of such simulation showed that decreasing the thickness of SU-8 can reduce the amount of residue from the SU-8 nanopattern. We confirmed that decreasing the thickness of SU-8 can also prevent the formation of residue from the SU-8 nanopattern with EBL.

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Property Variation of Ni–W Electroformed Mold for Micro-Press Molding

Cited by 7 publications

References 25 publications

Effect of metal ion concentration in Ni–W plating solution on surface roughness of Ni–W film

Effect of metal ion concentration in Ni–W plating solution on surface roughness of Ni–W film

A Comprehensive Review of Micro/Nano Precision Glass Molding Molds and Their Fabrication Methods

Effects of post exposure bake temperature and exposure time on SU-8 nanopattern obtained by electron beam lithography

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