Properties of TiN coatings deposited by the modified IPD method

Zdunek, Krzysztof; Nowakowska-Langier, Katarzyna; Choduń, Rafał; Kupczyk, Maciej Jan; Siwak, Piotr

doi:10.1016/j.vacuum.2010.01.024

Cited by 20 publications

(9 citation statements)

References 14 publications

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“…The electrodes material is continuously eroded, and the products of erosion enrich the plasma as synthesis reactants. A precise characterization of the IPD method has been described in the literature [22,23]. Fig.…”

Section: Methodsmentioning

confidence: 99%

The application of magnetic self-filter to optimization of AIN film growth process during the impulse plasma deposition synthesis

Choduń

Nowakowska-Langier

Okrasa

et al. 2016

Materials Science-Poland

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This work presents the very first results of the application of plasma magnetic filtering achieved by a coil coupled with an electrical circuit of a coaxial accelerator during the synthesis of AlN thin films by use of Impulse Plasma Deposition method (IPD). The uniqueness of this technical solution lies in the fact that the filter is not supplied, controlled and synchronized from any external device. Our solution uses the energy from the electrical circuit of plasma accelerator. The plasma state was described on the basis of OES studies. Estimation of the effects of plasma filtering on the film quality was carried out on the basis of characterization of structure morphology (SEM), phase and chemical composition (vibrational spectroscopy). Our work has shown that the use of the developed magnetic self-filter improved the structure of the AlN coatings synthesized under the condition of impulse plasma, especially by the minimization of the tendency to deposit metallic aluminum droplets and columnar growth.

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Section: Methodsmentioning

confidence: 99%

The application of magnetic self-filter to optimization of AIN film growth process during the impulse plasma deposition synthesis

Choduń

Nowakowska-Langier

Okrasa

et al. 2016

Materials Science-Poland

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“…The focus shots were fired at a frequency of one shot per minute at a long enough time to ensure thermal relaxation of the specimen after being heated by the preceding ion beam (21). The substrates were mounted axially above the anode at a distance of 10 cm, using a substrate holder.…”

Section: Methodsmentioning

confidence: 99%

“…(2) Electrons accelerate toward the titanium anode, and ablate the material from the anode. The ablated material can interact with reactive nitrogen ions of the same shot to form titanium nitride, and then it can be deposited at the SS316L substrate (20,21). Furthermore, some of the titanium plasma still does not react with generated nitrogen ions and atoms in each shot.…”

Section: Mechanism Of the Surface Modification By Pf Devicementioning

confidence: 99%

The effect of TiN nanoparticles deposition with different number of shots on SS316L by plasma focus device

Omrani¹,

Amrollahi²,

Habibi³

2013

Radiation Effects and Defects in Solids

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In this paper, we present the result of TiN nanocrystalline deposition on SS316L, using a 4 kJ plasma focus (PF) device for 10, 20, and 30 focus shots. The effect of different number of focus shots on micro-structural changes of thin film is characterized by field emission scanning electron microscope. Existence of grains in different size confirms the formation of TiN nanocrystals on the surface of SS316L substrate. X-ray diffraction (XRD) reveals the formation of a nanocrystalline titanium nitride coating on the surface of SS316L samples. The crystalline size of TiN obtained from XRD data is strongly dependent on the number of focus shots. Thickness of the elements found on the surface of the treated sample that obtain by Rutherford backscattering spectroscopy (RBS) analysis is in the range of 150 × 10 15 − 200 × 10 15 atoms/cm 2 . All the existence elements in the coated samples are identified by Particle Induced X-ray Emission (PIXE) spectra. Investigation on the corrosion resistance of TiN coatings was performed using an electrochemical potentiodynamic polarization. Our results suggest that TiN nanocrystalline implantation with proper ion fluences using PF can significantly improve the corrosion resistance of SS316L.

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“…In 2010, Zdunek et al [1] proposed a new variant of plasma surface engineering process, namely a control of the plasma process through the use of pulsed, periodically variable concentration of working gas in the range of threshold values of about of 10 −3 to 10 −1 Pa. The idea of the process is as follows [2]: while the electrodes are permanently polarized, the discharge (for example the glow discharge in case of magnetron sputtering) could be cyclically initiated and then vanished accordingly with the pressure pulses with a given frequency.…”

Section: Introductionmentioning

confidence: 99%

“…[8][9][10][11]); we named the "gas" modified PMS as the GIMS (Gas Injection Magnetron Sputtering) [7,12]. The use of gas mode for deposition of TiN coatings on non-heated cutting tools by the modified IPD method enabled 16-fold increase of the tools lifetime in comparison to the uncoated tools [1]. This is a substantial improvement compared with 2 to 4 times extending of the coated tools service life that was previously reported in literature for tools coated in industrial scale production with the use of regular, not modified IPD method (especially the IPD with continuous flow of the working gas under the pressure of about of 10 to 20 Pa) [13,14] and for tools or machine parts coated with the use of other plasma methods described in the literature (e.g.…”

Section: Introductionmentioning

confidence: 99%

Novel GIMS technique for deposition of colored Ti/TiO₂ coatings on industrial scale

Zdunek

Skowroński

Choduń

et al. 2016

Materials Science-Poland

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The aim of the present paper has been to verify the effectiveness and usefulness of a novel deposition process named GIMS (Gas Injection Magnetron Sputtering) used for the first time for deposition of Ti/TiO 2 coatings on large area glass substrates covered in the condition of industrial scale production. The Ti/TiO 2 coatings were deposited in an industrial system utilizing a set of linear magnetrons with the length of 2400 mm each for covering the 2000 × 3000 mm glasses. Taking into account the specific course of the GIMS (multipoint gas injection along the magnetron length) and the scale of the industrial facility, the optical coating uniformity was the most important goal to check. The experiments on Ti/TiO 2 coatings deposited by the use of GIMS were conducted on substrates in the form of glass plates located at the key points along the magnetrons and intentionally non-heated during any stage of the process. Measurements of the coatings properties showed that the thickness and optical uniformity of the 150 nm thick coatings deposited by GIMS in the industrial facility (the thickness differences on the large plates with 2000 mm width did not exceed 20 nm) is fully acceptable form the point of view of expected applications e.g. for architectural glazing.

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Properties of TiN coatings deposited by the modified IPD method

Cited by 20 publications

References 14 publications

The application of magnetic self-filter to optimization of AIN film growth process during the impulse plasma deposition synthesis

The application of magnetic self-filter to optimization of AIN film growth process during the impulse plasma deposition synthesis

The effect of TiN nanoparticles deposition with different number of shots on SS316L by plasma focus device

Novel GIMS technique for deposition of colored Ti/TiO₂ coatings on industrial scale

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