2008
DOI: 10.1016/j.jcrysgro.2008.08.017
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Properties of MOVPE GaN grown on ZnO deposited on Si(001) and Si(111) substrates

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Cited by 5 publications
(1 citation statement)
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“…Controllable doping of both n-type and p-type GaN is now reliably achieved 3,4 , making it suitable for a wide range of applications in optoelectronics, as well as for high-power, high-temperature electronics 5 and high electron mobility transistors 6,7 . Recently there has been much interest in integration of GaN on Si inspired by the potential for an inexpensive and scalable platform for growth 8,9 , as opposed to sapphire (Al 2 O 3 ) and SiC growth substrates. In addition to the cost and scalability, the Si platform also provides new device opportunities.…”
Section: Introductionmentioning
confidence: 99%
“…Controllable doping of both n-type and p-type GaN is now reliably achieved 3,4 , making it suitable for a wide range of applications in optoelectronics, as well as for high-power, high-temperature electronics 5 and high electron mobility transistors 6,7 . Recently there has been much interest in integration of GaN on Si inspired by the potential for an inexpensive and scalable platform for growth 8,9 , as opposed to sapphire (Al 2 O 3 ) and SiC growth substrates. In addition to the cost and scalability, the Si platform also provides new device opportunities.…”
Section: Introductionmentioning
confidence: 99%