Properties of MgTiO3 thin films prepared by RF magnetron sputtering for microwave application

The Effect of Mg Dopant and Oxygen Partial Pressure on Microstructure and Phase Transformation of ZnTiO3 Thin Films

“…Chen and Huang. [15] have shown that (100)-oriented MgTiO 3 films were obtained on the Si substrate. The preferred orientation tends to reduce the free energy to reach a stable state.…”

Raman Study of the Comparative Effects of Conventional and Microwave Annealing on MgTiO3 Thin Films Sputtered on Si Substrate

“…In the literature, textured MgTiO 3 thin films can be produced using different growth methods such as metalorganic solution deposition, [ 5 ] sol–gel process, [ 3,14 ] metal‐organic chemical vapor deposition, [ 15 ] rf magnetron sputtering, [ 10,11,16–19 ] pulsed laser deposition, [ 20 ] and aerosol deposition method. [ 21 ] However, the deposition of thin films by magnetron sputtering can be considered as an attractive technique for commercial production because it offers the possibility to deposit on a large surface.…”

“…[ 22 ] In the literature, most of the articles concerning the deposition of MgTiO 3 films by rf magnetron sputtering highlight the impact of the deposition temperature, chamber pressure, oxygen mixing percentage, rf power, and postannealing on the structural, electrical, optical, and dielectric properties of these thin layers. [ 10,11,13,16–19 ] Usually, MgTiO 3 films are sputtered from the MgTiO 3 target in a sputtering atmosphere that is either pure argon gas [ 17,18 ] or a mixture of pure argon and oxygen gases. [ 10,11,16,19 ] Thus, Huang et al reported that crystallinity, surface roughness, and grain size increase with substrate temperature.…”

“…[ 10,11,13,16–19 ] Usually, MgTiO 3 films are sputtered from the MgTiO 3 target in a sputtering atmosphere that is either pure argon gas [ 17,18 ] or a mixture of pure argon and oxygen gases. [ 10,11,16,19 ] Thus, Huang et al reported that crystallinity, surface roughness, and grain size increase with substrate temperature. [ 18 ] These trends were confirmed by Chen et al who also showed that an increase in pressure degrades crystallinity and induces a rise in porosity and in grain size.…”

“…[ 19 ] This phenomenon is amplified with the increase in the oxygen mixing percentage (OMP). [ 16,19 ] At the same time, a rise in the porosity and a drop in the crystallite size are emphasized. [ 19 ] Some articles report that as‐deposited MgTiO 3 films were amorphous whereas they become crystalline after a postdeposition annealing.…”