2014
DOI: 10.1016/j.ssc.2013.12.033
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Properties of Mg2Si (100) surfaces: A first-principles study

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Cited by 19 publications
(17 citation statements)
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“…The electronic band structure of the bulk Mg 2 Si has been described at length in the literature. 27−36 Mg 2 Si is a Γ−X indirect band gap semiconducting material with a calculated energy gap of 0.22 eV, very similar to that obtained by Liao et al 12 The experimental value is reported to be in the range of 0.66−0.78 eV. 37−39 The evolution of the bands with respect to the number of atomic planes N for the 001 slab (Figure 5a) shows that for 16 and 20 atomic planes the band structures are essentially the same.…”
Section: Resultssupporting
confidence: 82%
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“…The electronic band structure of the bulk Mg 2 Si has been described at length in the literature. 27−36 Mg 2 Si is a Γ−X indirect band gap semiconducting material with a calculated energy gap of 0.22 eV, very similar to that obtained by Liao et al 12 The experimental value is reported to be in the range of 0.66−0.78 eV. 37−39 The evolution of the bands with respect to the number of atomic planes N for the 001 slab (Figure 5a) shows that for 16 and 20 atomic planes the band structures are essentially the same.…”
Section: Resultssupporting
confidence: 82%
“…A vacuum size of around 10 Å should therefore be sufficient. This size of the vacuum thickness is similar to that found by Liao et al in their study of the 100 thin film . However, in our case, to ascertain the best possible quality of our results, the vacuum size has been set to 12 Å for all of the 001, 110, and 111 slabs.…”
Section: Calculation Detailsmentioning
confidence: 59%
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“…Only a few theoretical studies have been reported on the calculations of Mg 2 Si thin films, either dealing with the structural and electronic characteristics [15], or the thermoelectric properties of the films [16]. Whereas experimentally grown thin films are always polycrystalline with preferential orientations (001, 110 and 111), the theoretical studies deal only with monocrystalline thin films.…”
Section: Introductionmentioning
confidence: 99%